The　micro-polarizer　array　(MPA),　as　an　essential　micro-nano　optical　component,　has　wide　applications　in　polarization　imaging,　optical　information　processing,　and　quantum　optics.　Nevertheless,　conventional　laser　direct　writing　techniques　exhibit　low　efficiency　when　processing　discrete　patterns　in　MPA　and　suffer　from　problems　such　as　processing　path　deviations　and　poor　endpoint　morphology　consistency.　In　this　paper,　a　continuous　processing　method　for　discrete　patterns　in　different　directions　during　MPA　fabrication　was　proposed,　using　a　position-synchronized　exposure　strategy,　instead　of　asynchronous　exposure,　to　ensure　the　stability　of　the　scanning　speed　and　improve　the　processing　efficiency.　Additionally,　to　correct　the　processing　path　deviations　observed　during　experiments,　the　shutter　response　delay　time　was　measured,　and　a　compensation　path　was　introduced.　Acceleration　control　in　the　transition　regions　was　also　optimized　to　address　the　problem　of　uneven　endpoint　dimensions.　The　results　showed　that　the　optimized　method　achieved　an　average　scanning　speed　of　0.19　mm/s,　nearly　six　times　higher　than　the　traditional　method.　Meanwhile,　the　total　processing　time　was　reduced　to　287　s　(43%　of　the　traditional　method)　with　no　path　deviations　or　exposure　failures,　dramatically　improving　MPA　processing　efficiency　and　consistency.　©　2025　Optica　Publishing　Group.　All　rights,　including　for　text　and　data　mining　(TDM),　Artificial　Intelligence　(AI)　training,　and　similar　technologies,　are　reserved.