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author:

Wang, Xiumei (Wang, Xiumei.) [1] | Zhang, Guocheng (Zhang, Guocheng.) [2] | Yang, Huihuang (Yang, Huihuang.) [3] | Liu, Yaqian (Liu, Yaqian.) [4] | Chen, Shaomin (Chen, Shaomin.) [5] | Lin, Zhixian (Lin, Zhixian.) [6] (Scholars:林志贤) | Chen, Huipeng (Chen, Huipeng.) [7] (Scholars:陈惠鹏) | Guo, Tailiang (Guo, Tailiang.) [8] (Scholars:郭太良)

Indexed by:

EI Scopus SCIE

Abstract:

Future electronics would be conformal, bendable and wearable, which requires the flexible devices possess exceptional electronic properties and mechanical stability during mechanical deformation. However, in flexible electronic systems, the quantitative characterization of interface stress between layers, which significantly impacts the mechanical properties and electronic performance of flexible devices, is still not available, which limits the optimization of device performance and deep understanding of the relevant mechanism in flexible electronic devices. Here, for the first time, a nanoindentation technique is introduced to precisely characterize the interface stress of flexible organic field effect transistors (OFETs), which are also broadly applicable for other flexible electronic devices. Moreover, the effect of interface stress on the mechanical stability of flexible OFETs is investigated. Noticeably, the results first illustrated that interface stress could be tuned by controlling the interface adhesion energy between layers. The improved interface stress would directly decrease the mechanical damage to the insulator/semiconductor interface charge transfer during bending deformation and eventually improve the mechanical stability and electrical performance of flexible devices. This study clearly demonstrates that the nanoindentation technique is a promising tool to precisely characterize the interface stress of flexible electronic systems and provides guidelines for the fabrication of high performance flexible electronics.

Keyword:

Community:

  • [ 1 ] [Wang, Xiumei]Fuzhou Univ, Natl & Local United Engn Lab Flat Panel Display T, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 2 ] [Zhang, Guocheng]Fuzhou Univ, Natl & Local United Engn Lab Flat Panel Display T, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 3 ] [Yang, Huihuang]Fuzhou Univ, Natl & Local United Engn Lab Flat Panel Display T, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 4 ] [Liu, Yaqian]Fuzhou Univ, Natl & Local United Engn Lab Flat Panel Display T, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 5 ] [Chen, Shaomin]Fuzhou Univ, Natl & Local United Engn Lab Flat Panel Display T, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 6 ] [Lin, Zhixian]Fuzhou Univ, Natl & Local United Engn Lab Flat Panel Display T, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 7 ] [Chen, Huipeng]Fuzhou Univ, Natl & Local United Engn Lab Flat Panel Display T, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 8 ] [Guo, Tailiang]Fuzhou Univ, Natl & Local United Engn Lab Flat Panel Display T, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 9 ] [Wang, Xiumei]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 10 ] [Lin, Zhixian]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 11 ] [Chen, Huipeng]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 12 ] [Guo, Tailiang]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China

Reprint 's Address:

  • 陈惠鹏

    [Chen, Huipeng]Fuzhou Univ, Natl & Local United Engn Lab Flat Panel Display T, Inst Optoelect Display, Fuzhou 350002, Peoples R China;;[Chen, Huipeng]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China

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Source :

JOURNAL OF MATERIALS CHEMISTRY C

ISSN: 2050-7526

Year: 2020

Issue: 35

Volume: 8

Page: 12155-12163

7 . 3 9 3

JCR@2020

5 . 7 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:196

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 2

SCOPUS Cited Count: 2

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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