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author:

Wu, Xinjiang (Wu, Xinjiang.) [1] | Liu, Ruirui (Liu, Ruirui.) [2] | Gao, Jianjun (Gao, Jianjun.) [3] (Scholars:高建军) | Luo, Jian (Luo, Jian.) [4] | Geng, Haibin (Geng, Haibin.) [5]

Indexed by:

EI Scopus SCIE

Abstract:

Aself-made line laser liquid level measurement system was used to measure the fluctuation of molten metal free surface under pulsed magnetic field. The electromagnetic characteristics of pulsed electromagnetic force were mathematically analyzed. Results showed that the electromagnetic force presents oscillatory attenuation during a single pulse period. The electromagnetic force was composed of turning force f turn and non-turning force f. nonturn The direction of f turn was always consistent with the melt circumferential direction, which turned the f nonturn consisted of electromagnetic pull and push forces, which caused the melt to oscillate. Under the pulsed magnetic field, the free surface formed a meniscus with a high middle, low side structure. With increased pulsed field intensity, the center surface of molten melt had an oscillation of +/- 3.52mmat 0.187 T. The wave power density had only two spectral peaks (at 0.60 and 3.36 Hz) without a magnetic field. Under pulsed magnetic field, four spectral peaks were found at 0.40, 3.00, 6.50 and 13.00 Hz.

Keyword:

molten metal fluctuation pulsed electromagnetic force pulsed magnetic field

Community:

  • [ 1 ] [Wu, Xinjiang]Fujian Jiangxia Univ, Sch Engn, Fuzhou 350108, Peoples R China
  • [ 2 ] [Liu, Ruirui]Capital Aerosp Machinery Corp Ltd, Beijing 100076, Peoples R China
  • [ 3 ] [Gao, Jianjun]Fuzhou Univ, Sch Mech Engn & Automat, Fuzhou 350108, Peoples R China
  • [ 4 ] [Luo, Jian]Fuzhou Univ, Sch Mech Engn & Automat, Fuzhou 350108, Peoples R China
  • [ 5 ] [Geng, Haibin]Fuzhou Univ, Sch Mech Engn & Automat, Fuzhou 350108, Peoples R China

Reprint 's Address:

  • 高建军

    [Gao, Jianjun]Fuzhou Univ, Sch Mech Engn & Automat, Fuzhou 350108, Peoples R China

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Source :

MATERIALS RESEARCH EXPRESS

ISSN: 2053-1591

Year: 2020

Issue: 5

Volume: 7

1 . 8 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:196

JCR Journal Grade:4

Cited Count:

WoS CC Cited Count: 1

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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