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author:

Li, Xiaochun (Li, Xiaochun.) [1] | Cheng, Zhang (Cheng, Zhang.) [2] | Fang, Yuanxing (Fang, Yuanxing.) [3] (Scholars:方元行) | Fu, Xianzhi (Fu, Xianzhi.) [4] (Scholars:付贤智) | Wang, Xinchen (Wang, Xinchen.) [5] (Scholars:王心晨)

Indexed by:

EI Scopus SCIE

Abstract:

Photoelectrochemical water oxidation by polymeric carbon nitride (PCN) has recently received increasing scientific interest. Herein, phosphorus (P) is doped into PCN (p-PCN) films through in situ polymerization. p-PCN sheets are formed and vertically aligned on a conductive substrate, which is used as a photoanode. The optimal photocurrent density of the photoanode is approximate to 120 mu A cm(-2), which is more than two times that of the undoped one. The improved performance is accounted as the introduction of P in PCN. On the one hand, P doping increases the valence potential of PCN and improves the ability of water oxidation. On the other hand, charge transfer is improved by extra charges from P.

Keyword:

phosphorus doping photocatalysis photoelectrochemical polymeric carbon nitride water oxidation

Community:

  • [ 1 ] [Li, Xiaochun]Fuzhou Univ, Coll Chem, State Key Lab Photocatalysis Energy & Environm, Fuzhou 350002, Peoples R China
  • [ 2 ] [Cheng, Zhang]Fuzhou Univ, Coll Chem, State Key Lab Photocatalysis Energy & Environm, Fuzhou 350002, Peoples R China
  • [ 3 ] [Fang, Yuanxing]Fuzhou Univ, Coll Chem, State Key Lab Photocatalysis Energy & Environm, Fuzhou 350002, Peoples R China
  • [ 4 ] [Fu, Xianzhi]Fuzhou Univ, Coll Chem, State Key Lab Photocatalysis Energy & Environm, Fuzhou 350002, Peoples R China
  • [ 5 ] [Wang, Xinchen]Fuzhou Univ, Coll Chem, State Key Lab Photocatalysis Energy & Environm, Fuzhou 350002, Peoples R China

Reprint 's Address:

  • 方元行 王心晨

    [Fang, Yuanxing]Fuzhou Univ, Coll Chem, State Key Lab Photocatalysis Energy & Environm, Fuzhou 350002, Peoples R China;;[Wang, Xinchen]Fuzhou Univ, Coll Chem, State Key Lab Photocatalysis Energy & Environm, Fuzhou 350002, Peoples R China

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Source :

SOLAR RRL

ISSN: 2367-198X

Year: 2020

Issue: 8

Volume: 4

8 . 5 8 2

JCR@2020

6 . 0 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:196

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 32

SCOPUS Cited Count: 27

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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