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author:

Chen, Qizhen (Chen, Qizhen.) [1] | Yan, Yujie (Yan, Yujie.) [2] | Wu, Xiaomin (Wu, Xiaomin.) [3] | Wang, Xiumei (Wang, Xiumei.) [4] | Zhang, Guocheng (Zhang, Guocheng.) [5] | Chen, Jinwei (Chen, Jinwei.) [6] | Chen, Huipeng (Chen, Huipeng.) [7] (Scholars:陈惠鹏) | Guo, Tailiang (Guo, Tailiang.) [8] (Scholars:郭太良)

Indexed by:

EI Scopus SCIE

Abstract:

All-inorganic quantum-dot light emitting diodes (QLEDs) have attracted much attention due to their high stability. The main challenge in an all-inorganic QLED is that the hole mobility of the inorganic hole transport layer (HTL) is significantly lower than the electron mobility of the inorganic electron transport layer (ETL) which causes unbalanced charge injection and subsequent low performance. To address this issue, a novel gate-tunable all-inorganic QLED is proposed, where the additional gate electrode is able to modulate the hole injection ability and then precisely tune the charge balance in the QLED, resulting in the suppression of Auger recombination and a subsequent significant improvement in device performance. Finally, the all-inorganic QLEDs exhibit high performance with a maximum current efficiency (CE) of 14.2 cd A(-1) and an external quantum efficiency (EQE) of 10.7% along with high stability. The realization of long lifetime and high performance with our proposed device structure opens up new avenues for expanding the commercial applications of QLEDs. More importantly, this strategy is broadly applicable to various QLED systems to modulate the charge injection balance for further improvement in the device performance of QLEDs.

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Community:

  • [ 1 ] [Chen, Qizhen]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou 350002, Peoples R China
  • [ 2 ] [Yan, Yujie]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou 350002, Peoples R China
  • [ 3 ] [Wu, Xiaomin]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou 350002, Peoples R China
  • [ 4 ] [Wang, Xiumei]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou 350002, Peoples R China
  • [ 5 ] [Zhang, Guocheng]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou 350002, Peoples R China
  • [ 6 ] [Chen, Jinwei]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou 350002, Peoples R China
  • [ 7 ] [Chen, Huipeng]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou 350002, Peoples R China
  • [ 8 ] [Guo, Tailiang]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou 350002, Peoples R China
  • [ 9 ] [Zhang, Guocheng]Fujian Univ Technol, Coll Informat Sci & Engn, Fuzhou 350108, Peoples R China

Reprint 's Address:

  • 陈惠鹏

    [Chen, Huipeng]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou 350002, Peoples R China

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Source :

JOURNAL OF MATERIALS CHEMISTRY C

ISSN: 2050-7526

Year: 2020

Issue: 4

Volume: 8

Page: 1280-1285

7 . 3 9 3

JCR@2020

5 . 7 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:196

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 13

SCOPUS Cited Count: 13

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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