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author:

Li, Meng-Yue (Li, Meng-Yue.) [1] | Li, Bingxuan (Li, Bingxuan.) [2] | Lin, Hua (Lin, Hua.) [3] | Ma, Zuju (Ma, Zuju.) [4] | Wu, Li-Ming (Wu, Li-Ming.) [5] | Wu, Xin-Tao (Wu, Xin-Tao.) [6] | Zhu, Qi-Long (Zhu, Qi-Long.) [7]

Indexed by:

EI Scopus SCIE

Abstract:

Noncentrosymmetric (NCS) metal-chalcogenides have emerged as a candidate for infrared nonlinear optical (IR-NLO) materials, but it remains an enormous challenge to achieve simultaneously a large second-harmonic-generation (SHG) coefficient (d(ij)), strong laser-induced damage threshold (LIDT), wide phase-matching (PM) range, and low melting point (MP) in a single material. Herein, a novel ternary mixed-metal chalcogenide, Sn2Ga2S5, was prepared via a facile mid-temperature fluxing method. It adopts a polar space group Pna2(1) (no. 33) and shows a distinctive 3D NCS network made by (2)(infinity)[Ga2S54-] layers and (1)(infinity)[Sn2S68-] chains via the sharing of common corners. Significantly, Sn2Ga2S5 exhibits an excellent comprehensive performance for IR-NLO applications that surpasses the current benchmark of AgGaS2, including a strong SHG response d(ij) (2.5 X AgGaS2), high LIDT (6.6 x AgGaS2), wide PM range (>725 nm), broad transparent region (0.57-13.8 mu m), and low MP (ca. 958 K). Furthermore, the detailed theoretical calculation results elucidate that the strong d(ij) of Sn2Ga2S5 can be ascribed to the combined effect of two asymmetric building motifs (ABMs), that is, dimeric [Sn2S6] and [Ga2S5] units. Such a systematic work would provide some useful guidance for the prediction and discovery of new IR-NLO chalcogenides with mixed ABMs.

Keyword:

Community:

  • [ 1 ] [Li, Meng-Yue]Chinese Acad Sci, Fujian Inst Res Struct Matter, State Key Lab Struct Chem, Fuzhou 350002, Fujian, Peoples R China
  • [ 2 ] [Lin, Hua]Chinese Acad Sci, Fujian Inst Res Struct Matter, State Key Lab Struct Chem, Fuzhou 350002, Fujian, Peoples R China
  • [ 3 ] [Wu, Xin-Tao]Chinese Acad Sci, Fujian Inst Res Struct Matter, State Key Lab Struct Chem, Fuzhou 350002, Fujian, Peoples R China
  • [ 4 ] [Zhu, Qi-Long]Chinese Acad Sci, Fujian Inst Res Struct Matter, State Key Lab Struct Chem, Fuzhou 350002, Fujian, Peoples R China
  • [ 5 ] [Li, Bingxuan]Chinese Acad Sci, Fujian Inst Res Struct Matter, Key Lab Optoelect Mat Chem & Phys, Fuzhou 350002, Fujian, Peoples R China
  • [ 6 ] [Li, Meng-Yue]Fuzhou Univ, Coll Chem, Fuzhou 350002, Fujian, Peoples R China
  • [ 7 ] [Ma, Zuju]Anhui Univ Technol, Sch Mat Sci & Engn, Maanshan 243002, Peoples R China
  • [ 8 ] [Wu, Li-Ming]Beijing Normal Univ, Key Lab Theoret & Computat Photochem, Minist Educ, Coll Chem, Beijing 100875, Peoples R China

Reprint 's Address:

  • [Lin, Hua]Chinese Acad Sci, Fujian Inst Res Struct Matter, State Key Lab Struct Chem, Fuzhou 350002, Fujian, Peoples R China;;[Zhu, Qi-Long]Chinese Acad Sci, Fujian Inst Res Struct Matter, State Key Lab Struct Chem, Fuzhou 350002, Fujian, Peoples R China

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Source :

CHEMISTRY OF MATERIALS

ISSN: 0897-4756

Year: 2019

Issue: 16

Volume: 31

Page: 6268-6275

9 . 5 6 7

JCR@2019

7 . 2 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:236

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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