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author:

Li, Meng-Yue (Li, Meng-Yue.) [1] | Li, Bingxuan (Li, Bingxuan.) [2] | Lin, Hua (Lin, Hua.) [3] | Ma, Zuju (Ma, Zuju.) [4] | Wu, Li-Ming (Wu, Li-Ming.) [5] | Wu, Xin-Tao (Wu, Xin-Tao.) [6] | Zhu, Qi-Long (Zhu, Qi-Long.) [7]

Indexed by:

EI

Abstract:

Noncentrosymmetric (NCS) metal-chalcogenides have emerged as a candidate for infrared nonlinear optical (IR-NLO) materials, but it remains an enormous challenge to achieve simultaneously a large second-harmonic-generation (SHG) coefficient (dij), strong laser-induced damage threshold (LIDT), wide phase-matching (PM) range, and low melting point (MP) in a single material. Herein, a novel ternary mixed-metal chalcogenide, Sn2Ga2S5, was prepared via a facile mid-temperature fluxing method. It adopts a polar space group Pna21 (no. 33) and shows a distinctive 3D NCS network made by ∞2[Ga2S54-] layers and ∞1[Sn2S68-] chains via the sharing of common corners. Significantly, Sn2Ga2S5 exhibits an excellent comprehensive performance for IR-NLO applications that surpasses the current benchmark of AgGaS2, including a strong SHG response dij (2.5 × AgGaS2), high LIDT (6.6 × AgGaS2), wide PM range (>725 nm), broad transparent region (0.57-13.8 μm), and low MP (ca. 958 K). Furthermore, the detailed theoretical calculation results elucidate that the strong dij of Sn2Ga2S5 can be ascribed to the combined effect of two asymmetric building motifs (ABMs), that is, dimeric [Sn2S6] and [Ga2S5] units. Such a systematic work would provide some useful guidance for the prediction and discovery of new IR-NLO chalcogenides with mixed ABMs. © 2019 American Chemical Society.

Keyword:

Benchmarking Chalcogenides Gallium compounds Harmonic generation Laser damage Nonlinear optics Optical properties Phase matching Tin compounds

Community:

  • [ 1 ] [Li, Meng-Yue]State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, Fujian; 350002, China
  • [ 2 ] [Li, Meng-Yue]College of Chemistry, Fuzhou University, Fuzhou, Fujian; 350002, China
  • [ 3 ] [Li, Bingxuan]Key Laboratory of Optoelectronic Materials Chemistry and Physics, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, Fujian; 350002, China
  • [ 4 ] [Lin, Hua]State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, Fujian; 350002, China
  • [ 5 ] [Ma, Zuju]School of Materials Science and Engineering, Anhui University of Technology, Maanshan; 243002, China
  • [ 6 ] [Wu, Li-Ming]Key Laboratory of Theoretical and Computational Photochemistry, Ministry of Education, College of Chemistry, Beijing Normal University, Beijing; 100875, China
  • [ 7 ] [Wu, Xin-Tao]State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, Fujian; 350002, China
  • [ 8 ] [Zhu, Qi-Long]State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, Fujian; 350002, China

Reprint 's Address:

  • [lin, hua]state key laboratory of structural chemistry, fujian institute of research on the structure of matter, chinese academy of sciences, fuzhou, fujian; 350002, china

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Source :

Chemistry of Materials

ISSN: 0897-4756

Year: 2019

Issue: 16

Volume: 31

Page: 6268-6275

9 . 5 6 7

JCR@2019

7 . 2 0 0

JCR@2023

ESI HC Threshold:236

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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