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author:

Gu, Peng (Gu, Peng.) [1] | Yu, Jinling (Yu, Jinling.) [2] (Scholars:俞金玲) | Zeng, Xiaolin (Zeng, Xiaolin.) [3] | Cheng, Shuying (Cheng, Shuying.) [4] (Scholars:程树英) | Lai, Yunfeng (Lai, Yunfeng.) [5] (Scholars:赖云锋) | Zhou, Haifang (Zhou, Haifang.) [6] (Scholars:周海芳) | Zheng, Qiao (Zheng, Qiao.) [7] (Scholars:郑巧)

Indexed by:

EI SCIE

Abstract:

Topological insulator nanostructures with large surface-to-volume ratios are expected to significantly enhance topological surface conduction and have great potential applications in the future. We have synthesized the high quality bismuth selenide nanoplates by chemical vapor deposition on a mica substrate. Meanwhile, we investigate the effect of different growth temperatures and gas flow on the morphology, chemical stoichiometry and structure of bismuth selenide nanoplates by scanning electron microscopy, energy dispersive spectrometer and Raman spectra, respectively. It is found that the morphology of the Bi2Se3 nanoplates is greatly influenced by the growth temperature, due to the different growth dynamics under different temperatures. The energy dispersive spectra analysis shows that the Se/Bi atomic ratio first increases and then decreases with increasing temperature. The Raman spectra analysis suggests that some impurity phase appears at a growth temperature of 630 degrees C, and that the crystal quality is worse when the growth temperature is increased to 650 degrees C. We also find that gas flow will affect the morphology and the crystal quality of bismuth selenide nanoplates, but it has little effect on the chemical stoichiometry. The measurement results suggest that the best condition to synthesize bismuth selenide nanoplates by chemical vapor deposition on a mica substrate is 600 degrees C growth temperature and 70 sccm gas flow.

Keyword:

Bi2Se3 Nanoplate Chemical Vapor Deposition Growth Optimization

Community:

  • [ 1 ] [Gu, Peng]Fuzhou Univ, Sch Phys & Informat Engn, Inst Micro Nano Devices & Solar Cells, Fuzhou 350108, Fujian, Peoples R China
  • [ 2 ] [Yu, Jinling]Fuzhou Univ, Sch Phys & Informat Engn, Inst Micro Nano Devices & Solar Cells, Fuzhou 350108, Fujian, Peoples R China
  • [ 3 ] [Zeng, Xiaolin]Fuzhou Univ, Sch Phys & Informat Engn, Inst Micro Nano Devices & Solar Cells, Fuzhou 350108, Fujian, Peoples R China
  • [ 4 ] [Cheng, Shuying]Fuzhou Univ, Sch Phys & Informat Engn, Inst Micro Nano Devices & Solar Cells, Fuzhou 350108, Fujian, Peoples R China
  • [ 5 ] [Lai, Yunfeng]Fuzhou Univ, Sch Phys & Informat Engn, Inst Micro Nano Devices & Solar Cells, Fuzhou 350108, Fujian, Peoples R China
  • [ 6 ] [Zhou, Haifang]Fuzhou Univ, Sch Phys & Informat Engn, Inst Micro Nano Devices & Solar Cells, Fuzhou 350108, Fujian, Peoples R China
  • [ 7 ] [Zheng, Qiao]Fuzhou Univ, Sch Phys & Informat Engn, Inst Micro Nano Devices & Solar Cells, Fuzhou 350108, Fujian, Peoples R China
  • [ 8 ] [Cheng, Shuying]Changzhou Univ, Jiangsu Collaborat Innovat Ctr Photovolat Sci & E, Changzhou 213164, Jiangsu, Peoples R China

Reprint 's Address:

  • 俞金玲

    [Yu, Jinling]Fuzhou Univ, Sch Phys & Informat Engn, Inst Micro Nano Devices & Solar Cells, Fuzhou 350108, Fujian, Peoples R China

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Source :

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

ISSN: 1533-4880

Year: 2018

Issue: 11

Volume: 18

Page: 7590-7594

1 . 0 9 3

JCR@2018

1 . 1 3 4

JCR@2019

JCR Journal Grade:4

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count: 2

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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