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author:

Xiao, Fang-Xing (Xiao, Fang-Xing.) [1] (Scholars:肖方兴) | Liu, Bin (Liu, Bin.) [2]

Indexed by:

Scopus SCIE

Abstract:

Surface plasmon resonance (SPR) effect of metal nanostructures is established as an efficient and attractive strategy to boost visible-light or even near-infrared-responsive photo-electrochemical (PEC) water splitting devices for substantial solar-to-chemical energy conversion. Rational integration of plasmonic metal nanostructures with semiconductors in an appropriate fashion is beneficial for creating a large variety of plasmonic metal/semiconductor photoelectrodes. However, up to date, construction of well-defined and highly efficient plasmonic metal/semiconductor heterostructures is still in its infant stage. In this review, basic principles of PEC water splitting over semiconductors, SPR-excited plasmonic effect of metal nanostructures, and their intrinsic correlation with each other are first concisely introduced. Subsequently, it is paid great attention to specifically summarize the diverse plasmonic metal/semiconductor photoelectrodes currently being extensively explored for indirect plasmon-induced PEC water splitting. Particularly, different plasmonic metal/semiconductor nanoarchitectures including planar thin films, 1D composited, and 3D spatially hierarchical heterostructures are systematically classified and elucidated. Finally, future perspectives and challenges in triggering further innovative thinking on plasmon-enhanced solar water splitting are envisaged. It is anticipated that this review can provide enriched information on rational design and construction of various plasmonic metal/semiconductor heterostructures for solar-powered plasmon-based PEC devices.

Keyword:

heterostructures noble metal photo-electrochemical water splitting surface plasmon resonance

Community:

  • [ 1 ] [Xiao, Fang-Xing]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Fujian, Peoples R China
  • [ 2 ] [Liu, Bin]Nanyang Technol Univ, Sch Chem & Biomed Engn, 62 Nanyang Dr, Singapore 637459, Singapore

Reprint 's Address:

  • 肖方兴

    [Xiao, Fang-Xing]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Fujian, Peoples R China;;[Liu, Bin]Nanyang Technol Univ, Sch Chem & Biomed Engn, 62 Nanyang Dr, Singapore 637459, Singapore

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Source :

ADVANCED MATERIALS INTERFACES

ISSN: 2196-7350

Year: 2018

Issue: 6

Volume: 5

4 . 7 1 3

JCR@2018

4 . 3 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:284

JCR Journal Grade:1

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 96

SCOPUS Cited Count: 95

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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