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author:

Kuo, D. S. (Kuo, D. S..) [1] | Lam, K. T. (Lam, K. T..) [2] | Wen, K. H. (Wen, K. H..) [3] | Chang, S. J. (Chang, S. J..) [4] | Ko, T. K. (Ko, T. K..) [5] | Hon, S. J. (Hon, S. J..) [6]

Indexed by:

EI Scopus SCIE

Abstract:

The authors propose a simple Ar plasma treatment method to selectively damage the area underneath p-pad electrode of GaN-based light-emitting diodes (LEDs). It was found that we could form a highly resistive area so that the injected carriers will be forced to spread out horizontally for the. LED. Under 20 mA current injection, it was found that the output powers were 16.0, 17.9 and 17.3 mW while the forward voltages were 3.17, 3.19 and 3.20 V for conventional LED and LED with SiO2 layer, respectively. Moreover, the LED with Ar plasma treatment is superior to the other LEDs while operating at a higher injection current. (c) 2011 Elsevier Ltd. All rights reserved.

Keyword:

Ar plasma treatment Current spreading GaN LED

Community:

  • [ 1 ] [Kuo, D. S.]Natl Cheng Kung Univ, Ctr Micro Nano Sci & Technol, Res Ctr Energy Technol & Strategy, Inst Microelect,Adv Optoelect Technol Ctr, Tainan 70101, Taiwan
  • [ 2 ] [Chang, S. J.]Natl Cheng Kung Univ, Ctr Micro Nano Sci & Technol, Res Ctr Energy Technol & Strategy, Inst Microelect,Adv Optoelect Technol Ctr, Tainan 70101, Taiwan
  • [ 3 ] [Kuo, D. S.]Natl Cheng Kung Univ, Ctr Micro Nano Sci & Technol, Res Ctr Energy Technol & Strategy, Dept Elect Engn,Adv Optoelect Technol Ctr, Tainan 70101, Taiwan
  • [ 4 ] [Chang, S. J.]Natl Cheng Kung Univ, Ctr Micro Nano Sci & Technol, Res Ctr Energy Technol & Strategy, Dept Elect Engn,Adv Optoelect Technol Ctr, Tainan 70101, Taiwan
  • [ 5 ] [Lam, K. T.]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Fujian, Peoples R China
  • [ 6 ] [Wen, K. H.]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Fujian, Peoples R China
  • [ 7 ] [Ko, T. K.]Epistar Corp, Nitride Device Res & Dev Ctr, Tainan 744, Taiwan
  • [ 8 ] [Hon, S. J.]Epistar Corp, Nitride Device Res & Dev Ctr, Tainan 744, Taiwan

Reprint 's Address:

  • [Chang, S. J.]Natl Cheng Kung Univ, Ctr Micro Nano Sci & Technol, Res Ctr Energy Technol & Strategy, Inst Microelect,Adv Optoelect Technol Ctr, Tainan 70101, Taiwan

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Source :

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

ISSN: 1369-8001

Year: 2012

Issue: 1

Volume: 15

Page: 52-55

1 . 3 3 8

JCR@2012

4 . 2 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

JCR Journal Grade:2

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count: 3

SCOPUS Cited Count: 5

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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