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The authors propose a simple Ar plasma treatment method to selectively damage the area underneath p-pad electrode of GaN-based light-emitting diodes (LEDs). It was found that we could form a highly resistive area so that the injected carriers will be forced to spread out horizontally for the. LED. Under 20 mA current injection, it was found that the output powers were 16.0, 17.9 and 17.3 mW while the forward voltages were 3.17, 3.19 and 3.20 V for conventional LED and LED with SiO2 layer, respectively. Moreover, the LED with Ar plasma treatment is superior to the other LEDs while operating at a higher injection current. (c) 2011 Elsevier Ltd. All rights reserved.
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MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
ISSN: 1369-8001
Year: 2012
Issue: 1
Volume: 15
Page: 52-55
1 . 3 3 8
JCR@2012
4 . 2 0 0
JCR@2023
ESI Discipline: MATERIALS SCIENCE;
JCR Journal Grade:2
CAS Journal Grade:4
Cited Count:
WoS CC Cited Count: 3
SCOPUS Cited Count: 5
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count:
Chinese Cited Count:
30 Days PV: 0
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