Fogging　and　proximity　effects　are　two　major　factors　that　cause　inaccurate　exposure　and　thus　layout　pattern　distortions　in　e-beam　lithography.　In　this　paper,　we　propose　the　first　analytical　placement　algorithm　to　consider　both　the　fogging　and　proximity　effects.　We　first　formulate　the　global　placement　problem　as　a　separable　minimization　problem　with　linear　constraints,　where　different　objectives　can　be　tackled　one　by　one　in　an　alternating　fashion.　Then,　we　propose　a　novel　proximal　group　alternating　direction　method　of　multipliers　(ADMM)　to　solve　the　separable　minimization　problem　with　two　subproblems,　where　the　first　subproblem　(mainly　associated　with　wirelength　and　density)　is　solved　by　a　steepest　descent　method　without　line-search,　and　the　second　one　(mainly　associated　with　the　fogging　and　proximity　effects)　is　handled　by　an　analytical　scheme.　We　prove　the　property　of　global　convergence　of　the　proximal　group　ADMM　method.　Finally,　legalization　and　detailed　placement　are　used　to　legal　and　further　improve　the　placement　result.　Experimental　results　show　that　our　algorithm　is　effective　and　efficient　for　the　addressed　problem.　Compared　with　the　state-of-the-art　work,　our　algorithm　not　only　can　achieve　13.4%　smaller　fogging　variation　and　21.4%　lower　proximity　variation,　but　also　has　a　1.65x　speedup.