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author:

Lin, Wei (Lin, Wei.) [1] (Scholars:林伟) | Huang, Shizhen (Huang, Shizhen.) [2] (Scholars:黄世震) | Lin, Weiming (Lin, Weiming.) [3] | Chen, Xueqing (Chen, Xueqing.) [4]

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  • [ 1 ] [Lin, Wei]Fuzhou Univ, Dept Phys, Fuzhou 350002, Peoples R China
  • [ 2 ] [Huang, Shizhen]Fuzhou Univ, Dept Phys, Fuzhou 350002, Peoples R China
  • [ 3 ] [Lin, Weiming]Fuzhou Univ, Dept Phys, Fuzhou 350002, Peoples R China
  • [ 4 ] [Chen, Xueqing]Fuzhou Univ, Dept Phys, Fuzhou 350002, Peoples R China
  • [ 5 ] [Lin, Wei]Fuzhou Univ, Fujian Key Lab Microelectron & Integrated Circuit, Dept Elect, Fuzhou 350002, Peoples R China
  • [ 6 ] [Huang, Shizhen]Fuzhou Univ, Fujian Key Lab Microelectron & Integrated Circuit, Dept Elect, Fuzhou 350002, Peoples R China
  • [ 7 ] [Lin, Weiming]Fuzhou Univ, Fujian Key Lab Microelectron & Integrated Circuit, Dept Elect, Fuzhou 350002, Peoples R China
  • [ 8 ] [Chen, Xueqing]Fuzhou Univ, Fujian Key Lab Microelectron & Integrated Circuit, Dept Elect, Fuzhou 350002, Peoples R China

Reprint 's Address:

  • 林伟

    [Lin, Wei]Fuzhou Univ, Dept Phys, Fuzhou 350002, Peoples R China

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Source :

ICIEA 2008: 3RD IEEE CONFERENCE ON INDUSTRIAL ELECTRONICS AND APPLICATIONS, PROCEEDINGS, VOLS 1-3

ISSN: 2156-2318

Year: 2008

Page: 1691-,

Language: English

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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