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author:

Hu, Hailong (Hu, Hailong.) [1] | Zhu, Jingguang (Zhu, Jingguang.) [2] | Chen, Maosheng (Chen, Maosheng.) [3] | Guo, Tailiang (Guo, Tailiang.) [4] | Li, Fushan (Li, Fushan.) [5]

Indexed by:

EI

Abstract:

High-performance inkjet-printed nickel oxide thin-film transistors (TFTs) with Al2O3 high-k dielectric have been fabricated using a sol-gel precursor ink. The 'coffee ring' effect during the printing process was facilely restrained by modifying the viscosity of the ink to control the outward capillary flow. The impacts on the device performance was studied in detail in consideration of annealing temperature of the nickel oxide film and the properties of dielectric layer. The optimized switching ability of the device were achieved at an annealing temperature of 280 °C on a 50-nm-thick Al2O3 dielectric layer, with a hole mobility of 0.78 cm2/V·s, threshold voltage of −0.6 V and on/off current ratio of 5.3 × 104. The as-printed p-type oxide TFTs show potential application in low-cost, large-area complementary electronic devices. © 2018 Elsevier B.V.

Keyword:

Alumina Aluminum oxide High-k dielectric Hole mobility Ink Ink jet printing Nickel oxide Oxide films Sol-gels Thin film circuits Thin films Thin film transistors Threshold voltage

Community:

  • [ 1 ] [Hu, Hailong]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350002, China
  • [ 2 ] [Zhu, Jingguang]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350002, China
  • [ 3 ] [Chen, Maosheng]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350002, China
  • [ 4 ] [Guo, Tailiang]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350002, China
  • [ 5 ] [Li, Fushan]College of Physics and Information Engineering, Fuzhou University, Fuzhou; 350002, China

Reprint 's Address:

  • [hu, hailong]college of physics and information engineering, fuzhou university, fuzhou; 350002, china

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Source :

Applied Surface Science

ISSN: 0169-4332

Year: 2018

Volume: 441

Page: 295-302

5 . 1 5 5

JCR@2018

6 . 3 0 0

JCR@2023

ESI HC Threshold:284

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 53

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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