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author:

Hu, Hailong (Hu, Hailong.) [1] (Scholars:胡海龙) | Zhu, Jingguang (Zhu, Jingguang.) [2] | Chen, Maosheng (Chen, Maosheng.) [3] | Guo, Tailiang (Guo, Tailiang.) [4] (Scholars:郭太良) | Li, Fushan (Li, Fushan.) [5] (Scholars:李福山)

Indexed by:

EI Scopus SCIE

Abstract:

High-performance inkjet-printed nickel oxide thin-film transistors (TFTs) with Al2O3 high-k dielectric have been fabricated using a sol-gel precursor ink. The "coffee ring" effect during the printing process was facilely restrained by modifying the viscosity of the ink to control the outward capillary flow. The impacts on the device performance was studied in detail in consideration of annealing temperature of the nickel oxide film and the properties of dielectric layer. The optimized switching ability of the device were achieved at an annealing temperature of 280 degrees C on a 50-nm-thick Al2O3 dielectric layer, with a hole mobility of 0.78 cm(2)/V.s, threshold voltage of -0.6 V and on/off current ratio of 5.3 x 10(4). The as-printed p-type oxide TFTs show potential application in low-cost, large-area complementary electronic devices. (C) 2018 Elsevier B.V. All rights reserved.

Keyword:

Coffee-ring effect High performance Inkjet printing Nickel oxide p-type Thin film transistor

Community:

  • [ 1 ] [Hu, Hailong]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350002, Fujian, Peoples R China
  • [ 2 ] [Zhu, Jingguang]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350002, Fujian, Peoples R China
  • [ 3 ] [Chen, Maosheng]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350002, Fujian, Peoples R China
  • [ 4 ] [Guo, Tailiang]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350002, Fujian, Peoples R China
  • [ 5 ] [Li, Fushan]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350002, Fujian, Peoples R China

Reprint 's Address:

  • 胡海龙 李福山

    [Hu, Hailong]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350002, Fujian, Peoples R China;;[Li, Fushan]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350002, Fujian, Peoples R China

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Source :

APPLIED SURFACE SCIENCE

ISSN: 0169-4332

Year: 2018

Volume: 441

Page: 295-302

5 . 1 5 5

JCR@2018

6 . 3 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:284

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 55

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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