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Abstract:
Noble single-atom catalysts have rapidly been attracting attention due to their unique catalytic properties and maximized utilization. Atomic layer deposition (ALD) is an emerging powerful technique for large-scale synthesis of stable single atom. In this review, we summarize recent developments of single atom synthesized by ALD as well as explore future research direction and trends. © 2017 Dalian Institute of Chemical Physics, the Chinese Academy of Sciences
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Source :
Chinese Journal of Catalysis
ISSN: 0253-9837
CN: 21-1601/O6
Year: 2017
Issue: 9
Volume: 38
Page: 1508-1514
3 . 5 2 5
JCR@2017
1 5 . 7 0 0
JCR@2023
ESI HC Threshold:226
JCR Journal Grade:1
CAS Journal Grade:2
Cited Count:
SCOPUS Cited Count: 66
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count:
Chinese Cited Count:
30 Days PV: 2
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