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author:

Cheng, Niancai (Cheng, Niancai.) [1] | Sun, Xueliang (Sun, Xueliang.) [2]

Indexed by:

EI PKU CSCD

Abstract:

Noble single-atom catalysts have rapidly been attracting attention due to their unique catalytic properties and maximized utilization. Atomic layer deposition (ALD) is an emerging powerful technique for large-scale synthesis of stable single atom. In this review, we summarize recent developments of single atom synthesized by ALD as well as explore future research direction and trends. © 2017 Dalian Institute of Chemical Physics, the Chinese Academy of Sciences

Keyword:

Atomic layer deposition Atoms Catalysis Catalysts Mechanisms

Community:

  • [ 1 ] [Cheng, Niancai]Department of Mechanical and Materials Engineering, University of Western Ontario, London; ON; N6A 5B9, Canada
  • [ 2 ] [Cheng, Niancai]College of Materials Science and Engineering, Fuzhou University, Fuzhou; Fujian; 350108, China
  • [ 3 ] [Sun, Xueliang]Department of Mechanical and Materials Engineering, University of Western Ontario, London; ON; N6A 5B9, Canada

Reprint 's Address:

  • [sun, xueliang]department of mechanical and materials engineering, university of western ontario, london; on; n6a 5b9, canada

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Source :

Chinese Journal of Catalysis

ISSN: 0253-9837

CN: 21-1601/O6

Year: 2017

Issue: 9

Volume: 38

Page: 1508-1514

3 . 5 2 5

JCR@2017

1 5 . 7 0 0

JCR@2023

ESI HC Threshold:226

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 66

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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