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Abstract:
Noble singleatom catalysts have rapidly been attracting attention due to their unique catalytic properties and maximized utilization. Atomic layer deposition (ALD) is an emerging powerful technique for large-scale synthesis of stable single atom. In this review, we summarize recent developments of single atom synthesized by ALD as well as explore future research direction and trends. (C) 2017, Dalian Institute of Chemical Physics, Chinese Academy of Sciences. Published by Elsevier B.V. All rights reserved.
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CHINESE JOURNAL OF CATALYSIS
ISSN: 0253-9837
CN: 21-1601/O6
Year: 2017
Issue: 9
Volume: 38
Page: 1508-1514
3 . 5 2 5
JCR@2017
1 5 . 7 0 0
JCR@2023
ESI Discipline: CHEMISTRY;
ESI HC Threshold:226
JCR Journal Grade:1
CAS Journal Grade:2
Cited Count:
WoS CC Cited Count: 55
SCOPUS Cited Count: 67
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count:
Chinese Cited Count:
30 Days PV: 2
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