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author:

Cheng, Niancai (Cheng, Niancai.) [1] (Scholars:程年才) | Sun, Xueliang (Andy) (Sun, Xueliang (Andy).) [2]

Indexed by:

CPCI-S EI Scopus SCIE PKU CSCD

Abstract:

Noble singleatom catalysts have rapidly been attracting attention due to their unique catalytic properties and maximized utilization. Atomic layer deposition (ALD) is an emerging powerful technique for large-scale synthesis of stable single atom. In this review, we summarize recent developments of single atom synthesized by ALD as well as explore future research direction and trends. (C) 2017, Dalian Institute of Chemical Physics, Chinese Academy of Sciences. Published by Elsevier B.V. All rights reserved.

Keyword:

Atomic layer deposition Catalysis Mechanism Noble catalyst Single-atom

Community:

  • [ 1 ] [Cheng, Niancai]Univ Western Ontario, Dept Mech & Mat Engn, London, ON N6A 5B9, Canada
  • [ 2 ] [Sun, Xueliang (Andy)]Univ Western Ontario, Dept Mech & Mat Engn, London, ON N6A 5B9, Canada
  • [ 3 ] [Cheng, Niancai]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Fujian, Peoples R China

Reprint 's Address:

  • [Sun, Xueliang (Andy)]Univ Western Ontario, Dept Mech & Mat Engn, London, ON N6A 5B9, Canada

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Source :

CHINESE JOURNAL OF CATALYSIS

ISSN: 0253-9837

CN: 21-1601/O6

Year: 2017

Issue: 9

Volume: 38

Page: 1508-1514

3 . 5 2 5

JCR@2017

1 5 . 7 0 0

JCR@2023

ESI Discipline: CHEMISTRY;

ESI HC Threshold:226

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 55

SCOPUS Cited Count: 67

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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