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author:

Ye, Yun (Ye, Yun.) [1] | Chen, Tian-Yuan (Chen, Tian-Yuan.) [2] | Guo, Tai-Liang (Guo, Tai-Liang.) [3] | Jiang, Ya-Dong (Jiang, Ya-Dong.) [4]

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EI PKU CSCD

Abstract:

The effect of magnetic field assisted heat-treatment on the field emission properties of metalized multi-walled carbon nanotubes (MWNTs) is investigated. The metalized MWNTs are prepared via an electroless plating method, and then the MWNTs/Ni cathodes are fabricated by screen printing. The morphology and composition of MWNTs/Ni were studied by transmission electron microscopy and energy dispersive X-ray detector, and the difference between MWNTs/Ni cathodes heat-treated with or without magnetic field was observed by scanning electron microscopy. The force of a single MWNT coated with Ni was simulated, and the results demonstrate that the magnetic field force could induce the rotation of MWNTs/Ni during magnetic field assisted heat-treatment. The field emission characteristics show that the MWNTs/Ni cathodes heat-treated with magnetic field has a low turn-on field of 0.80 V·μm-1 and high field enhancement factor of 16068, which are attributed to the embossment of MWNTs/Ni from substrates under the magnetic field. © 2014 Chinese Physical Society.

Keyword:

Electroless plating Field emission Field emission cathodes Field emission displays Heat treatment High resolution transmission electron microscopy Magnetic fields Metallizing Metals Multiwalled carbon nanotubes (MWCN) Nanotubes Scanning electron microscopy Screen printing X ray detectors

Community:

  • [ 1 ] [Ye, Yun]College of Physics and Telecommunication Engineering, Fuzhou University, Fuzhou 350002, China
  • [ 2 ] [Chen, Tian-Yuan]College of Physics and Telecommunication Engineering, Fuzhou University, Fuzhou 350002, China
  • [ 3 ] [Guo, Tai-Liang]College of Physics and Telecommunication Engineering, Fuzhou University, Fuzhou 350002, China
  • [ 4 ] [Jiang, Ya-Dong]State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China

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Source :

Acta Physica Sinica

ISSN: 1000-3290

Year: 2014

Issue: 8

Volume: 63

0 . 8 1 3

JCR@2014

0 . 8 0 0

JCR@2023

ESI HC Threshold:213

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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