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author:

Zhu, Junqiu (Zhu, Junqiu.) [1] | Lu, Hengda (Lu, Hengda.) [2] | Wang, Xin (Wang, Xin.) [3] | Zhang, Teng (Zhang, Teng.) [4] | Shao, Yanqun (Shao, Yanqun.) [5] | Tang, Dian (Tang, Dian.) [6]

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EI PKU CSCD

Abstract:

A series of binary RuO2-Ta2O5 oxide composites with different Ru/Ta molar ratios were deposited on titanium substrate by a thermal decomposition method. The structure, voltametrical characteristics and capacitive properties as a function of the Ru/Ta molar ratios were investigated by X-ray diffraction (XRD), cyclic voltammetry (CV) and galvanostatic charge-discharge tests. The results show that the degree of crystallization of the Ti/RuO2-Ta2O5 electrodes decreases with the increase of Ta2O5 content in the RuO2-Ta2O5 oxide coatings. A completely amorphous structure exists as the proportion of Ta2O5 is up to 70 mol% or higher. The electrochemical performance of the Ti/RuO2-Ta2O5 electrodes is closely related with the composition and structure. The specific capacitance increases firstly and then decreases with the ratio of Ta to Ru in oxide coatings, and a maximum specific capacitance of 621.2 F·g-1(RuO2) is obtained when the Ta2O5 content is 70 mol%. Copyright © 2013, Northwest Institute for Nonferrous Metal Research. Published by Elsevier BV. All rights reserved.

Keyword:

Capacitance Cyclic voltammetry Decomposition Electric discharges Electrochemical electrodes Molar ratio Protective coatings Ruthenium compounds Supercapacitor Tantalum oxides Titanium oxides

Community:

  • [ 1 ] [Zhu, Junqiu]Fuzhou University, Fuzhou 350108, China
  • [ 2 ] [Lu, Hengda]Fuzhou University, Fuzhou 350108, China
  • [ 3 ] [Wang, Xin]Fuzhou University, Fuzhou 350108, China
  • [ 4 ] [Zhang, Teng]Fuzhou University, Fuzhou 350108, China
  • [ 5 ] [Shao, Yanqun]Fuzhou University, Fuzhou 350108, China
  • [ 6 ] [Tang, Dian]Fuzhou University, Fuzhou 350108, China

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Source :

Rare Metal Materials and Engineering

ISSN: 1002-185X

Year: 2013

Issue: 3

Volume: 42

Page: 555-559

0 . 1 5 3

JCR@2013

0 . 6 0 0

JCR@2023

JCR Journal Grade:4

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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