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author:

Zheng, Long-Wu (Zheng, Long-Wu.) [1] | Hu, Li-Qin (Hu, Li-Qin.) [2] | Xiao, Xiao-Jing (Xiao, Xiao-Jing.) [3] | Yang, Fan (Yang, Fan.) [4] | Lin, He (Lin, He.) [5] | Guo, Tai-Liang (Guo, Tai-Liang.) [6]

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EI CSCD

Abstract:

A novel magnetically controlled Ni-plating method has been developed to improve the field-emission properties of carbon nanotubes (CNTs). The effect of the magnetic field and Ni-electroplating on CNT field-emission properties was investigated, and the results are demonstrated using scanning electron microscopy, J - E and the duration test. After treatment, the turn-on electric field declines from 1.55 to 0.91 V/μm at an emission current density of 100 μA/cm2, and the emission current density increases from 0.011 to 0.34 mA/cm2 at an electric field of 1.0 V/μm. Both the brightness and uniformity of the CNT emission performance are improved after treatment. © 2011 Chinese Physical Society and IOP Publishing Ltd.

Keyword:

Carbon nanotubes Electric fields Electroplating Field emission Magnetic fields Nickel Scanning electron microscopy

Community:

  • [ 1 ] [Zheng, Long-Wu]Institute of Optoelectronic Display Technology, School of Physics and Information Engineering, Fuzhou University, Fuzhou 350002, China
  • [ 2 ] [Hu, Li-Qin]Institute of Optoelectronic Display Technology, School of Physics and Information Engineering, Fuzhou University, Fuzhou 350002, China
  • [ 3 ] [Xiao, Xiao-Jing]Institute of Optoelectronic Display Technology, School of Physics and Information Engineering, Fuzhou University, Fuzhou 350002, China
  • [ 4 ] [Yang, Fan]Institute of Optoelectronic Display Technology, School of Physics and Information Engineering, Fuzhou University, Fuzhou 350002, China
  • [ 5 ] [Lin, He]Institute of Optoelectronic Display Technology, School of Physics and Information Engineering, Fuzhou University, Fuzhou 350002, China
  • [ 6 ] [Guo, Tai-Liang]Institute of Optoelectronic Display Technology, School of Physics and Information Engineering, Fuzhou University, Fuzhou 350002, China

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Source :

Chinese Physics B

ISSN: 1674-1056

Year: 2011

Issue: 12

Volume: 20

1 . 3 7 6

JCR@2011

1 . 5 0 0

JCR@2023

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 6

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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