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Abstract：
The performance of AZ5214E image-reversal photoresist was studied and achieves negative sidewalls when choosing proper processes. They are good for lift-off technics. It could be used to lift off 2 μm Au for the facture of RF MEMS switch. The negative sidewalls can be observed with SEM.
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Journal of Functional Materials
ISSN： 1001-9731
CN： 50-1099/TH
Year： 2005
Issue： 3
Volume： 36
Page： 431-433,440
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ESI Highly Cited Papers on the List： 0 Unfold All
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30 Days PV： 1
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