Electrodeposition,a　novel　and　convenient　approach,has　been　used　for　fabricating　porous　NiS　thin　films　on　Ni　foam　substrate.The　obtained　NiS/Ni　thin　films　were　characterized　by　scanning　electron　microscopy　(SEM),transmission　electron　microscopy　(TEM),X-ray　photoelectron　spectroscopy　(XPS)　and　energy　dispersive　spectrometer　(EDS).Furthermore,the　obtained　NiS/Ni　thin　films　were　first　used　as　the　anode　for　lithium-ion　intercalation　and　exhibited　larger　capacity　and　good　cycle　stability.