Abstract:
介绍了在玻璃衬底上射频磁控溅射SiO2薄膜的工艺技术,给出了薄膜淀积速率,膜内组分与工艺条件特别是溅射气压的关系.实验证明,和其他镀膜技术相比,射频磁控溅射可以在更低的温度下制备致密、均匀、重复性好的Si02薄膜.
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龙岩师专学报
ISSN: 1673-4629
CN: 35-1286/G4
Year: 2002
Issue: 6
Volume: 20
Page: 44-45,48
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count:
Chinese Cited Count:
30 Days PV: 4
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