Indexed by:
Abstract:
介绍了一种用于场致发射显示的平面多层膜电子发射结构的制作过程, 采用真空溅射的方法镀制玻璃衬底/Cr-Cu/ Al2O3/ZnS /Ag结构的平面电子源, 对其发射性能进行了论述, 并取得优化发射性能的工艺参数.
Keyword:
Reprint 's Address:
Email:
Version:
Source :
福州大学学报(自然科学版)
ISSN: 1000-2243
CN: 35-1337/N
Year: 2002
Issue: 6
Volume: 30
Page: 789-792
Cited Count:
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count:
Chinese Cited Count:
30 Days PV: 4
Affiliated Colleges: