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author:

Yang, Yu (Yang, Yu.) [1] | Ji, Tao (Ji, Tao.) [2] | Lin, Yuan (Lin, Yuan.) [3] | Su, Wenyue (Su, Wenyue.) [4]

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EI

Abstract:

Photocatalytic cementitious materials (PCMs) are a promising material for air purification at ambient conditions. Herein, polymeric carbon nitride (PCN), a material with high chemical and thermal stability that is responsive to visible light, was employed for the fabrication of PCMs with the assistance of two adhesives (i.e., acrylic latex and waterglass). The effect of the adhesives on the photocatalytic removal of nitrogen oxides (NOx) and their stability over the PCN-coated PCMs was studied under various environmental conditions. Experimental results indicated that the waterglass-based PCMs outperformed the acrylic latex-based PCMs in terms of the photocatalytic NOx removal under visible light irradiation and stability in the peeling and washing trials. The relative humidity had beneficial effects on the NOx removal efficiency for the acrylic latex and deleterious effects on the waterglass incorporated PCMs, due to their distinct surface wettability. The ambient temperature, initial nitrogen monoxide (NO) concentration, and light intensity had a positive impact on the NOx removal efficiency for the as-prepared PCMs. © 2021 Elsevier Ltd

Keyword:

Adhesives Air cleaners Carbon nitride Chemical stability Efficiency Light Nitrogen oxides Nitrogen removal Photocatalytic activity Polymers

Community:

  • [ 1 ] [Yang, Yu]School of Civil Engineering, Fujian University of Technology, Fuzhou; 350118, China
  • [ 2 ] [Yang, Yu]College of Civil Engineering, Fuzhou University, Fuzhou; 350116, China
  • [ 3 ] [Ji, Tao]College of Civil Engineering, Fuzhou University, Fuzhou; 350116, China
  • [ 4 ] [Lin, Yuan]State Key Laboratory of Photocatalysis on Energy and Environment, Fuzhou University, Fuzhou; 350116, China
  • [ 5 ] [Su, Wenyue]State Key Laboratory of Photocatalysis on Energy and Environment, Fuzhou University, Fuzhou; 350116, China

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Source :

Journal of Cleaner Production

ISSN: 0959-6526

Year: 2021

Volume: 295

1 1 . 0 7 2

JCR@2021

9 . 8 0 0

JCR@2023

ESI HC Threshold:105

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 9

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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