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author:

He, Lihua (He, Lihua.) [1] | Li, Enlong (Li, Enlong.) [2] | He, Weixin (He, Weixin.) [3] | Yan, Yujie (Yan, Yujie.) [4] | Lan, Shuqiong (Lan, Shuqiong.) [5] | Yu, Rengjian (Yu, Rengjian.) [6] | Chen, Huipeng (Chen, Huipeng.) [7] | Guo, Tailiang (Guo, Tailiang.) [8]

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EI

Abstract:

Organic thin film transistor (OTFT) based nonvolatile memory has made significant progress due to its biocompatibility, flexibility, and low cost, in which ferroelectric transistor memory and floating gate transistor memory play the main roles in organic nonvolatile transistor memory. Here, a novel layered hybrid structure OTFT nonvolatile memory is invented by combining ferroelectric poly(vinylidene fluoride-co-trifluoroethylene) P(VDF-TrFE) with a floating gate layer utilizing CdSe/ZnS quantum dots (QDs), which integrates the advantages of ferroelectric memory and floating gate memory. The core–shell structured CdSe/Zns QDs are acted as robust charge trapping centers due to their band structure similar to a quantum well, preventing the back diffuse of trapped charges, while P(VDF-TrFE) provides additional polarized electric field to modulate the capture of charge. The resultant devices exhibit high on-state current (≈10−5 A), low off-state current (≈10−10 A), excellent switch ratio (≈105), and retention characteristic (>104 s). Furthermore, a superior memory window, more than 85.6% of scanning voltage range, higher than most reported organic transistor memories, is achieved, which endows the device wide operating condition and significant discrimination between on and off state. The fine-structured OTFT memory opens up a unique path for desirable memory to meet the growing demand of microelectronic industry. © 2021 Wiley-VCH GmbH

Keyword:

Biocompatibility Cadmium compounds Charge trapping Electric fields Ferroelectricity Field effect transistors Fluorine compounds II-VI semiconductors Microelectronics Nonvolatile storage Semiconductor quantum dots Semiconductor quantum wells Thin film transistors

Community:

  • [ 1 ] [He, Lihua]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 2 ] [Li, Enlong]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 3 ] [He, Weixin]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 4 ] [Yan, Yujie]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 5 ] [Lan, Shuqiong]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 6 ] [Yu, Rengjian]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 7 ] [Chen, Huipeng]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 8 ] [Chen, Huipeng]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou; 350100, China
  • [ 9 ] [Guo, Tailiang]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 10 ] [Guo, Tailiang]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou; 350100, China

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Source :

Advanced Electronic Materials

Year: 2021

Issue: 11

Volume: 7

7 . 6 3 3

JCR@2021

5 . 3 0 0

JCR@2023

ESI HC Threshold:142

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 6

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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