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author:

Zhang, Guocheng (Zhang, Guocheng.) [1] | Ma, Chao (Ma, Chao.) [2] | Wu, Xiaomin (Wu, Xiaomin.) [3] | Zhang, Xianghong (Zhang, Xianghong.) [4] | Gao, Changsong (Gao, Changsong.) [5] | Chen, Huipeng (Chen, Huipeng.) [6] | Guo, Tailiang (Guo, Tailiang.) [7]

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EI

Abstract:

In order to comply with the rapid development of new-generation electronics, developing memories which could meet the demands for specific application such as flexibility, transparency and neuromorphic functions are of great significance. In this work, a transparent organic nonvolatile memory (transparency≥81%) is developed with Ag nanowire as floating gate layer, which exhibits excellent memory characteristics and mechanical flexibility. Moreover, the transition from memory to artificial synapse is achieved by adjusting the concentration of Ag nanowire. This work provides a new solution for transparent flexible memory and shows their potential for next-generation transparent organic electronics. © 1980-2012 IEEE.

Keyword:

Energy gap Flexible electronics Nanowires Next generation networks Substrates Transparency

Community:

  • [ 1 ] [Zhang, Guocheng]Fujian University of Technology, Research Center for Microelectronics Technology, Fuzhou; 350108, China
  • [ 2 ] [Ma, Chao]Fujian University of Technology, Research Center for Microelectronics Technology, Fuzhou; 350108, China
  • [ 3 ] [Wu, Xiaomin]Institute of Optoelectronic Display, Fuzhou University, National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou; 350002, China
  • [ 4 ] [Wu, Xiaomin]Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou; 350100, China
  • [ 5 ] [Zhang, Xianghong]Institute of Optoelectronic Display, Fuzhou University, National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou; 350002, China
  • [ 6 ] [Zhang, Xianghong]Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou; 350100, China
  • [ 7 ] [Gao, Changsong]Institute of Optoelectronic Display, Fuzhou University, National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou; 350002, China
  • [ 8 ] [Gao, Changsong]Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou; 350100, China
  • [ 9 ] [Chen, Huipeng]Institute of Optoelectronic Display, Fuzhou University, National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou; 350002, China
  • [ 10 ] [Chen, Huipeng]Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou; 350100, China
  • [ 11 ] [Guo, Tailiang]Institute of Optoelectronic Display, Fuzhou University, National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou; 350002, China
  • [ 12 ] [Guo, Tailiang]Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou; 350100, China

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Source :

IEEE Electron Device Letters

ISSN: 0741-3106

Year: 2022

Issue: 5

Volume: 43

Page: 733-736

4 . 9

JCR@2022

4 . 1 0 0

JCR@2023

ESI HC Threshold:66

JCR Journal Grade:2

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 10

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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