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author:

Zhao, Lin (Zhao, Lin.) [1] | Yang, Bixia (Yang, Bixia.) [2] | Zhuang, Guoxin (Zhuang, Guoxin.) [3] | Wen, Yonglin (Wen, Yonglin.) [4] | Zhang, Tingshi (Zhang, Tingshi.) [5] | Lin, Mingxiong (Lin, Mingxiong.) [6] | Zhuang, Zanyong (Zhuang, Zanyong.) [7] (Scholars:庄赞勇) | Yu, Yan (Yu, Yan.) [8] (Scholars:于岩)

Indexed by:

EI Scopus SCIE

Abstract:

Exploitation of atomic-level principles to optimize the charge transfer on ultrathin 2D heterostructures is an emerging frontier in relieving the energy and environmental crisis. Herein, a facile "topological-atom-extraction" protocol is disclosed, i.e., selective extraction of Zn from ultrathin half-unit-cell ZnIn2S4 (HZIS) can embed thin In2O3 domain into 1.60 nm thick HZIS layer to create an atomically thin in-plane In2O3/HZIS heterostructure. Thanks to the optimal distance and capability of charge separation, the in-plane In2O3/HZIS heterostructure is among the best ZnIn2S4-based CO2 reduction reaction (CRR) photocatalysts, and indeed demonstrates a significant increase (from 6.8- to 128-fold) in CO production rate compared with those of out-plane ZIS@In2O3 and out-plane In2O3-HZIS(calcined) heterostructures. Density Functional Theory simulation reveals that whereas the out-plane heterostructure has a much smaller increment q of 0.2-0.25 e, the in-plane heterostructure with "zero distance contact" has an optimal increment q of 1.05 e between In2O3 and HZIS that induces remarkable charge redistribution on the in-plane heterojunction interface and creates local electric field confined within the ultrathin layer. The charge redistribution efficiently directs the charge-carrier separation in S-scheme photocatalytic system and endows long-lifetime carrier to CRR active HZIS. The findings demonstrate the strong versatility of engineering atomic-level heterojunctions for efficient catalysts design.

Keyword:

2D materials (2) photoreduction CO in-plane heterostructures S-Scheme topological atom extraction

Community:

  • [ 1 ] [Zhao, Lin]Fuzhou Univ, Coll Mat Sci & Engn, New Campus, Fuzhou 350108, Fujian, Peoples R China
  • [ 2 ] [Yang, Bixia]Fuzhou Univ, Coll Mat Sci & Engn, New Campus, Fuzhou 350108, Fujian, Peoples R China
  • [ 3 ] [Zhuang, Guoxin]Fuzhou Univ, Coll Mat Sci & Engn, New Campus, Fuzhou 350108, Fujian, Peoples R China
  • [ 4 ] [Wen, Yonglin]Fuzhou Univ, Coll Mat Sci & Engn, New Campus, Fuzhou 350108, Fujian, Peoples R China
  • [ 5 ] [Zhang, Tingshi]Fuzhou Univ, Coll Mat Sci & Engn, New Campus, Fuzhou 350108, Fujian, Peoples R China
  • [ 6 ] [Lin, Mingxiong]Fuzhou Univ, Coll Mat Sci & Engn, New Campus, Fuzhou 350108, Fujian, Peoples R China
  • [ 7 ] [Zhuang, Zanyong]Fuzhou Univ, Coll Mat Sci & Engn, New Campus, Fuzhou 350108, Fujian, Peoples R China
  • [ 8 ] [Yu, Yan]Fuzhou Univ, Coll Mat Sci & Engn, New Campus, Fuzhou 350108, Fujian, Peoples R China
  • [ 9 ] [Zhao, Lin]Fuzhou Univ, Key Lab Adv Mat Technol, Fuzhou 350108, Peoples R China
  • [ 10 ] [Yang, Bixia]Fuzhou Univ, Key Lab Adv Mat Technol, Fuzhou 350108, Peoples R China
  • [ 11 ] [Zhuang, Guoxin]Fuzhou Univ, Key Lab Adv Mat Technol, Fuzhou 350108, Peoples R China
  • [ 12 ] [Wen, Yonglin]Fuzhou Univ, Key Lab Adv Mat Technol, Fuzhou 350108, Peoples R China
  • [ 13 ] [Zhang, Tingshi]Fuzhou Univ, Key Lab Adv Mat Technol, Fuzhou 350108, Peoples R China
  • [ 14 ] [Lin, Mingxiong]Fuzhou Univ, Key Lab Adv Mat Technol, Fuzhou 350108, Peoples R China
  • [ 15 ] [Zhuang, Zanyong]Fuzhou Univ, Key Lab Adv Mat Technol, Fuzhou 350108, Peoples R China
  • [ 16 ] [Yu, Yan]Fuzhou Univ, Key Lab Adv Mat Technol, Fuzhou 350108, Peoples R China

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Source :

SMALL

ISSN: 1613-6810

Year: 2022

Issue: 28

Volume: 18

1 3 . 3

JCR@2022

1 3 . 0 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:91

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 33

SCOPUS Cited Count: 44

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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