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author:

Su, Nan (Su, Nan.) [1] | Liu, Mengying (Liu, Mengying.) [2] | Qiu, Silong (Qiu, Silong.) [3] | Hu, Congyi (Hu, Congyi.) [4] | Yin, Xiangyu (Yin, Xiangyu.) [5] (Scholars:阴翔宇) | Xiao, Longqiang (Xiao, Longqiang.) [6] (Scholars:肖龙强) | Hou, Linxi (Hou, Linxi.) [7] (Scholars:侯琳熙)

Indexed by:

EI Scopus SCIE

Abstract:

CoSx materials with high catalytic activity are considered as promising HER electrocatalysts, but their inherent low electrical conductivity and easy loss of active sites have greatly limited their applications in OER electrocatalysis. Herein, we present a convenient method to synthesize Co-Cu hollow nanoprisms after wrapping and calcining with trithiocyanuric acid (C3H3N3S3) (denoted N-Co-Cu-S-x HNs). The results showed that Cu doping modified the charge density of Co center, leading to the enhancement of the intrinsic activity of the Co3S4 active center, meanwhile wrapping trithiocyanuric acid on the sur-faces and calcinating to form N-containing C skeleton as a flexible substrate to encapsulate the catalysts, which effectively protected the active sites inside the catalysts. Notably, the OER catalyst that was opti-mized by adjusting the metal ratio and controlling the trithiocyanuric acid incorporation exhibited a low overpotential of 306 mV under a current density of 10 mA cm-2 and showed a superior durability of more than 27 h. This work may provide some insights into the preparation of oxygen evolution reaction cata-lysts with excellent performance through doping transition metals and protecting the internal active sites strategies.(c) 2022 Elsevier Inc. All rights reserved.

Keyword:

Hollow nanoprisms N-Co-Cu-S-x N-containing C skeleton Oxygen evolution reaction Trithiocyanuric acid

Community:

  • [ 1 ] [Su, Nan]Fuzhou Univ, Coll Chem Engn, Fuzhou 350116, Peoples R China
  • [ 2 ] [Liu, Mengying]Fuzhou Univ, Coll Chem Engn, Fuzhou 350116, Peoples R China
  • [ 3 ] [Qiu, Silong]Fuzhou Univ, Coll Chem Engn, Fuzhou 350116, Peoples R China
  • [ 4 ] [Hu, Congyi]Fuzhou Univ, Coll Chem Engn, Fuzhou 350116, Peoples R China
  • [ 5 ] [Yin, Xiangyu]Fuzhou Univ, Coll Chem Engn, Fuzhou 350116, Peoples R China
  • [ 6 ] [Xiao, Longqiang]Fuzhou Univ, Coll Chem Engn, Fuzhou 350116, Peoples R China
  • [ 7 ] [Hou, Linxi]Fuzhou Univ, Coll Chem Engn, Fuzhou 350116, Peoples R China
  • [ 8 ] [Xiao, Longqiang]Qingyuan Innovat Lab, Quanzhou 362801, Peoples R China
  • [ 9 ] [Hou, Linxi]Qingyuan Innovat Lab, Quanzhou 362801, Peoples R China
  • [ 10 ] [Hou, Linxi]Fuzhou Univ, Adv Mfg Technol Specialty Chem, Fujian Key Lab, Fuzhou 350116, Peoples R China

Reprint 's Address:

  • [Xiao, Longqiang]Fuzhou Univ, Coll Chem Engn, Fuzhou 350116, Peoples R China;;[Hou, Linxi]Fuzhou Univ, Coll Chem Engn, Fuzhou 350116, Peoples R China;;[Xiao, Longqiang]Qingyuan Innovat Lab, Quanzhou 362801, Peoples R China;;[Hou, Linxi]Qingyuan Innovat Lab, Quanzhou 362801, Peoples R China;;[Hou, Linxi]Fuzhou Univ, Adv Mfg Technol Specialty Chem, Fujian Key Lab, Fuzhou 350116, Peoples R China;;

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Source :

JOURNAL OF COLLOID AND INTERFACE SCIENCE

ISSN: 0021-9797

Year: 2023

Volume: 629

Page: 763-772

9 . 4

JCR@2023

9 . 4 0 0

JCR@2023

ESI Discipline: CHEMISTRY;

ESI HC Threshold:39

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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