This　paper　presents　a　patternable　two-color　quantum　dot　(QD)　color　conversion　film　based　on　photolithography　technique.　Toluene-assisted　dispersion　of　QD　powder　with　the　best　performance　matching　was　selected　from　four　typical　dispersions　by　experimental　comparison.　On　this　basis,　the　color　conversion　film　of　QD　was　prepared　by　photolithography　technique.　The　experimental　results　show　that　the　height　of　the　patternable　QD　microstructures　has　good　consistency.　At　the　same　time,　the　monochromatic　spectrum　test　shows　that　the　spectral　characteristics　of　QDs　are　not　significantly　affected　by　the　photolithographic　process.　Therefore,　the　preparation　methods　described　in　this　paper　can　provide　a　reference　for　related　research.