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author:

Lin, Bin (Lin, Bin.) [1] | Chen, Xiaotang (Chen, Xiaotang.) [2] | Chen, Junfeng (Chen, Junfeng.) [3] (Scholars:陈俊锋) | Chen, Shujian (Chen, Shujian.) [4] | Lu, Ruihan (Lu, Ruihan.) [5] | Liang, Siyan (Liang, Siyan.) [6] | Cui, Xiping (Cui, Xiping.) [7] | Chi, Haitao (Chi, Haitao.) [8] | Zou, Linchi (Zou, Linchi.) [9]

Indexed by:

EI Scopus SCIE

Abstract:

We developed a simple method of in-situ synthesize carbon nanotubes (CNTs) on Ti-6Al -4V (TC4) alloy powder to fabricate CNTs/TC4 compound powders through plasmaenhanced chemical vapor deposition (PECVD). By this approach, CNTs on TC4 alloy powder exhibit better uniform dispersion and morphology compared with the traditional CVD methods. In order to reveal the growth behavior of CNTs during the PECVD process, XRD, SEM, TEM, and Raman spectroscopy were used to analyze the morphology and graphitization of CNTs at different synthesis conditions. The plasma is benefit to the pyrolysis of CH4, but overmuch plasma bombardment also reduces the yield and quality of CNTs. The number of CNTs can be significantly improved with appropriately increasing the temperature and time, but excessive temperature, time and carbon concentration can increase the number of impurities such as amorphous carbon. Significantly, the growth mechanism of CNTs synthesized in TC4 powders is following tip-growth mode in PECVD process. Additionally, the quantity and quality were satisfactory at 600 & DEG;C for 30 min with 50 W plasma power. This study about PECVD process lays a foundation for improving the comprehensive properties of CNTs/TC4 composites in the future. & COPY; 2023 The Authors. Published by Elsevier B.V. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/).

Keyword:

Carbon nanotubes deposition Growth behavior In-situ synthesis Plasma-enhanced chemical vapor TC4 alloy powder

Community:

  • [ 1 ] [Lin, Bin]Fuzhou Univ, Sch Mat Sci & Engn, Qishan Campus, Minhou 350116, Fujian, Peoples R China
  • [ 2 ] [Chen, Xiaotang]Fuzhou Univ, Sch Mat Sci & Engn, Qishan Campus, Minhou 350116, Fujian, Peoples R China
  • [ 3 ] [Chen, Junfeng]Fuzhou Univ, Sch Mat Sci & Engn, Qishan Campus, Minhou 350116, Fujian, Peoples R China
  • [ 4 ] [Chen, Shujian]Fuzhou Univ, Sch Mat Sci & Engn, Qishan Campus, Minhou 350116, Fujian, Peoples R China
  • [ 5 ] [Lu, Ruihan]Fuzhou Univ, Sch Mat Sci & Engn, Qishan Campus, Minhou 350116, Fujian, Peoples R China
  • [ 6 ] [Liang, Siyan]Harbin Inst Technol Shenzhen, Sch Mat Sci & Engn, Shenzhen 518055, Peoples R China
  • [ 7 ] [Cui, Xiping]Harbin Inst Technol, Sch Mat Sci & Engn, Harbin 350001, Peoples R China
  • [ 8 ] [Chi, Haitao]Fujian Xiangxin Light Alloys Manufacture Co Ltd, Fuzhou 350119, Peoples R China
  • [ 9 ] [Zou, Linchi]Fujian Univ Technol, Sch Mat Sci & Engn, Fuzhou 350118, Peoples R China

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Source :

JOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY-JMR&T

ISSN: 2238-7854

Year: 2023

Volume: 24

Page: 9928-9938

6 . 2

JCR@2023

6 . 2 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:49

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 2

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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