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author:

Chen, Yanghai (Chen, Yanghai.) [1] | Zhu, Mingzhu (Zhu, Mingzhu.) [2] (Scholars:朱明珠) | He, Bingwei (He, Bingwei.) [3] (Scholars:何炳蔚) | Deng, Zhen (Deng, Zhen.) [4] (Scholars:邓震)

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Scopus SCIE

Abstract:

PurposeThe re-measurement of full-arch implant digital impressions is an important step in denture restoration. This paper provides an efficient oral photogrammetry technology using projective invariant marker, applied in the re-measurement of full-arch implant digital impressions.MethodsWe have developed a self-recognizing marker with projection invariance, along with its detection code. The marker is installed on the scanning body and used for photogrammetric measurements. Triangulation is utilized to determine the 3D coordinates of the marker, followed by a series of post-processing steps to obtain more accurate 3D coordinates.ResultsThe experimental data indicate that the optimal working distance is between 200 and 250 mm, with a minimum measurement error of less than 0.05 mm and an average measurement error of 0.10 mm. The measurement time is less than 2 min.ConclusionsThe experimental results show that the photogrammetric system can obtain reliable positions of full-arch implants with efficient photogrammetry, without the need to enter the patient's oral cavity, and has potential clinical application value.

Keyword:

Fiducial marker Implant Photogrammetry Projective invariant

Community:

  • [ 1 ] [Chen, Yanghai]Fuzhou Univ, Sch Mech Engn & Automat, Fuzhou 350108, Fujian, Peoples R China
  • [ 2 ] [Zhu, Mingzhu]Fuzhou Univ, Sch Mech Engn & Automat, Fuzhou 350108, Fujian, Peoples R China
  • [ 3 ] [He, Bingwei]Fuzhou Univ, Sch Mech Engn & Automat, Fuzhou 350108, Fujian, Peoples R China
  • [ 4 ] [Deng, Zhen]Fuzhou Univ, Sch Mech Engn & Automat, Fuzhou 350108, Fujian, Peoples R China

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Source :

INTERNATIONAL JOURNAL OF COMPUTER ASSISTED RADIOLOGY AND SURGERY

ISSN: 1861-6410

Year: 2023

Issue: 4

Volume: 19

Page: 767-778

2 . 3

JCR@2023

2 . 3 0 0

JCR@2023

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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