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author:

An, Chuanbin (An, Chuanbin.) [1] | Dong, Weijia (Dong, Weijia.) [2] | Yu, Rengjian (Yu, Rengjian.) [3] | Xu, Chenhui (Xu, Chenhui.) [4] | Pei, Dandan (Pei, Dandan.) [5] | Wang, Xiumei (Wang, Xiumei.) [6] | Chen, Huipeng (Chen, Huipeng.) [7] (Scholars:陈惠鹏) | Chi, Chunyan (Chi, Chunyan.) [8] | Han, Yang (Han, Yang.) [9] | Geng, Yanhou (Geng, Yanhou.) [10]

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EI Scopus SCIE

Abstract:

The design of high-performance stretchable n-type semiconductors is important in the construction of complementary circuits for flexible electronics. Herein, we propose a strategy by blending an electron transport-conjugated polymer poly(7,7 '-difluoro-N,N '-bis(6-(trioctylsilyl)hexyl)-isoindigo-alt-(E)-1,2-bis(3,4-difluorothien-2-yl)ethene) (IID-SiC8) with a hole transport elastic block copolymer poly[2,5-bis(3-tetradecylthiophen-2-yl)thieno[3,2-b]thiophene]-block-hydrogenated hydroxyl-terminated polybutadiene (PBTTT-b-HTPB) to achieve stretchable semiconductors with high electron mobility and synaptic function in organic thin-film transistors. The p-type segments of PBTTT-b-HTPB behave as trap centers for minority holes to improve the overall performance of n-channel transistors or function as hole-trapping/detrapping sites to create memory windows, depending on the blending ratio. By adding 25 wt % PBTTT-b-HTPB, the blend film exhibits mobility up to 1.71 cm(2) V-1 s(-1), which is the highest value of n-type stretchable semiconductors so far, together with a high on/off ratio of 10(6)-10(7). Notably, the mobility of the nanofilm remains almost unchanged after 1000 stretching cycles under 100% strain due to good fatigue resistance. By adding 75 wt % PBTTT-b-HTPB, synaptic functions were realized as a response to gate voltage pulse. Neuromorphic computing simulation constructed with this synaptic transistor can conduct pattern recognition at high accuracy up to 85.00%. Our multipurpose strategy of employing a single matrix that can simultaneously tune mechanical properties and electrical functions offers the prospect of high-performance stretchable functional optoelectronic devices.

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Community:

  • [ 1 ] [An, Chuanbin]Tianjin Univ, Joint Sch Natl Univ Singapore & Tianjin Univ, Int Campus, Fuzhou 350207, Peoples R China
  • [ 2 ] [Geng, Yanhou]Tianjin Univ, Joint Sch Natl Univ Singapore & Tianjin Univ, Int Campus, Fuzhou 350207, Peoples R China
  • [ 3 ] [An, Chuanbin]Tianjin Univ, Sch Mat Sci & Engn, Tianjin 300072, Peoples R China
  • [ 4 ] [Dong, Weijia]Tianjin Univ, Sch Mat Sci & Engn, Tianjin 300072, Peoples R China
  • [ 5 ] [Xu, Chenhui]Tianjin Univ, Sch Mat Sci & Engn, Tianjin 300072, Peoples R China
  • [ 6 ] [Pei, Dandan]Tianjin Univ, Sch Mat Sci & Engn, Tianjin 300072, Peoples R China
  • [ 7 ] [Han, Yang]Tianjin Univ, Sch Mat Sci & Engn, Tianjin 300072, Peoples R China
  • [ 8 ] [Geng, Yanhou]Tianjin Univ, Sch Mat Sci & Engn, Tianjin 300072, Peoples R China
  • [ 9 ] [An, Chuanbin]Tianjin Univ, Tianjin Key Lab Mol Optoelect Sci, Tianjin 300072, Peoples R China
  • [ 10 ] [Dong, Weijia]Tianjin Univ, Tianjin Key Lab Mol Optoelect Sci, Tianjin 300072, Peoples R China
  • [ 11 ] [Xu, Chenhui]Tianjin Univ, Tianjin Key Lab Mol Optoelect Sci, Tianjin 300072, Peoples R China
  • [ 12 ] [Pei, Dandan]Tianjin Univ, Tianjin Key Lab Mol Optoelect Sci, Tianjin 300072, Peoples R China
  • [ 13 ] [Han, Yang]Tianjin Univ, Tianjin Key Lab Mol Optoelect Sci, Tianjin 300072, Peoples R China
  • [ 14 ] [Geng, Yanhou]Tianjin Univ, Tianjin Key Lab Mol Optoelect Sci, Tianjin 300072, Peoples R China
  • [ 15 ] [An, Chuanbin]Natl Univ Singapore, Dept Chem, Singapore 117543, Singapore
  • [ 16 ] [Chi, Chunyan]Natl Univ Singapore, Dept Chem, Singapore 117543, Singapore
  • [ 17 ] [Yu, Rengjian]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display Te, Fuzhou 350002, Peoples R China
  • [ 18 ] [Chen, Huipeng]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display Te, Fuzhou 350002, Peoples R China
  • [ 19 ] [Wang, Xiumei]Anhui Agr Univ, Sch Sci, Hefei 230036, Peoples R China

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Source :

CHEMISTRY OF MATERIALS

ISSN: 0897-4756

Year: 2023

Issue: 1

Volume: 36

Page: 450-460

7 . 2

JCR@2023

7 . 2 0 0

JCR@2023

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 3

SCOPUS Cited Count: 2

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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