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author:

Fan, H.-C. (Fan, H.-C..) [1] | Wang, C. (Wang, C..) [2] | Ruan, Y.-J. (Ruan, Y.-J..) [3] | Shen, K.-C. (Shen, K.-C..) [4] | Wu, W.-Y. (Wu, W.-Y..) [5] | Wuu, D.-S. (Wuu, D.-S..) [6] | Lai, F.-M. (Lai, F.-M..) [7] | Lien, S.-Y. (Lien, S.-Y..) [8] | Zhu, W.-Z. (Zhu, W.-Z..) [9]

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Scopus

Abstract:

In this article, the tunable Zn-doped Ga2O3 films were obtained by introducing ZnO intercalation during the film deposition using plasma-enhanced atomic layer deposition (PEALD). The effect of the ZnO cycle ratio on the performance of solar-blind photodetectors (PDs) was first analyzed. Compared to the pure Ga2O3, an obviously enhanced performance of Zn-doped Ga2O3 films PDs was observed by the introduction of Zn dopants, especially photocurrent or responsivity, even if the light intensity is low. A high sensitivity of Zn-doped Ga2O3 PD has been achieved with superior photoelectric characteristics for an extremely low dark current of 2.22 × 10-13 A, an ultrahigh light ON/ OFF current ratio of 2.89 × 106, and a satisfactory responsivity of 104 mA/W when the ZnO cycle ratio is 5%. The above excellent results imply that the Zn-doped Ga2O3 PD can be greatly beneficial to the application in deep-ultraviolet (DUV) detection.  © 1963-2012 IEEE.

Keyword:

High sensitivity plasma enhanced atomic layer deposition (PEALD) solar-blind photodetector (PD) tunable ZnO cycle ratio Zn-doped Ga2O3film

Community:

  • [ 1 ] [Fan H.-C.]Xiamen University of Technology, Xiamen Key Laboratory of Development and Application for Advanced Semiconductor Coating Technology, School of Opto-Electronic and Communication Engineering, Xiamen, 361026, China
  • [ 2 ] [Wang C.]Xiamen University of Technology, Xiamen Key Laboratory of Development and Application for Advanced Semiconductor Coating Technology, School of Opto-Electronic and Communication Engineering, Xiamen, 361026, China
  • [ 3 ] [Ruan Y.-J.]Xiamen Institute of Measurement and Testing, National Measurement and Testing Center for Flat Panel Display Industry, Xiamen, 361024, China
  • [ 4 ] [Shen K.-C.]Fuzhou University, College of Physics and Information Engineering, Fuzhou, 350108, China
  • [ 5 ] [Wu W.-Y.]National United University, Department of Materials Science and Engineering, Miaoli, 36063, Taiwan
  • [ 6 ] [Wuu D.-S.]National Chi Nan University, Department of Applied Materials and Optoelectronic Engineering, Nantou, 54561, Taiwan
  • [ 7 ] [Lai F.-M.]Da-Yeh University, Department of Biomedical Engineering, Changhua, 51591, Taiwan
  • [ 8 ] [Lien S.-Y.]Xiamen University of Technology, Xiamen Key Laboratory of Development and Application for Advanced Semiconductor Coating Technology, School of Opto-Electronic and Communication Engineering, Xiamen, 361026, China
  • [ 9 ] [Lien S.-Y.]Da-Yeh University, Department of Biomedical Engineering, Changhua, 51591, Taiwan
  • [ 10 ] [Zhu W.-Z.]Xiamen University of Technology, Xiamen Key Laboratory of Development and Application for Advanced Semiconductor Coating Technology, School of Opto-Electronic and Communication Engineering, Xiamen, 361026, China

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Source :

IEEE Transactions on Electron Devices

ISSN: 0018-9383

Year: 2024

Issue: 1

Volume: 71

Page: 664-669

2 . 9 0 0

JCR@2023

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 2

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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