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author:

Fan, Hui-Chen (Fan, Hui-Chen.) [1] | Wang, Chen (Wang, Chen.) [2] | Ruan, Yu-Jiao (Ruan, Yu-Jiao.) [3] | Shen, Kun-Ching (Shen, Kun-Ching.) [4] | Wu, Wan-Yu (Wu, Wan-Yu.) [5] | Wuu, Dong-Sing (Wuu, Dong-Sing.) [6] | Lai, Feng-Min (Lai, Feng-Min.) [7] | Lien, Shui-Yang (Lien, Shui-Yang.) [8] | Zhu, Wen-Zhang (Zhu, Wen-Zhang.) [9]

Indexed by:

EI Scopus SCIE

Abstract:

In this article, the tunable Zn-doped Ga2O3 films were obtained by introducing ZnO intercalation during the film deposition using plasma-enhanced atomic layer deposition (PEALD). The effect of the ZnO cycle ratio on the performance of solar-blind photodetectors (PDs) was first analyzed. Compared to the pure Ga2O3 , an obviously enhanced performance of Zn-doped Ga2O3 films PDs was observed by the introduction of Zn dopants, especially photocurrent or responsivity, even if the light intensity is low. A high sensitivity of Zn-doped Ga2O3 PD has been achieved with superior photoelectric characteristics for an extremely low dark current of 2.22 x 10( -13) A, an ultrahigh light ON/OFF current ratio of 2.89 x 10(6) , and a satisfactory responsivity of 10(4 )mA/W when the ZnO cycle ratio is 5%. The above excellent results imply that the Zn-doped Ga 2 O 3 PD can be greatly beneficial to the application in deep-ultraviolet (DUV) detection.

Keyword:

High sensitivity plasma enhanced atomic layer deposition (PEALD) solar-blind photodetector (PD) tunable ZnO cycle ratio Zn-doped Ga2O3 film

Community:

  • [ 1 ] [Fan, Hui-Chen]Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361026, Peoples R China
  • [ 2 ] [Wang, Chen]Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361026, Peoples R China
  • [ 3 ] [Lien, Shui-Yang]Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361026, Peoples R China
  • [ 4 ] [Zhu, Wen-Zhang]Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361026, Peoples R China
  • [ 5 ] [Ruan, Yu-Jiao]Xiamen Inst Measurement & Testing, Natl Measurement & Testing Ctr Flat Panel Display, Xiamen 361024, Peoples R China
  • [ 6 ] [Shen, Kun-Ching]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 7 ] [Wu, Wan-Yu]Natl United Univ, Dept Mat Sci & Engn, Miaoli 36063, Taiwan
  • [ 8 ] [Wuu, Dong-Sing]Natl Chi Nan Univ, Dept Appl Mat & Optoelect Engn, Nantou 54561, Taiwan
  • [ 9 ] [Lai, Feng-Min]Da Yeh Univ, Dept Biomed Engn, Changhua 51591, Taiwan

Reprint 's Address:

  • [Wang, Chen]Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361026, Peoples R China;;[Lien, Shui-Yang]Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361026, Peoples R China;;

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Source :

IEEE TRANSACTIONS ON ELECTRON DEVICES

ISSN: 0018-9383

Year: 2023

Issue: 1

Volume: 71

Page: 664-669

2 . 9

JCR@2023

2 . 9 0 0

JCR@2023

JCR Journal Grade:2

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 2

SCOPUS Cited Count: 2

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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