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author:

Xu, X. (Xu, X..) [1] | Deng, Y. (Deng, Y..) [2] | Li, T. (Li, T..) [3] | Yang, D. (Yang, D..) [5] | Zhu, M. (Zhu, M..) [6] | Zhang, H. (Zhang, H..) [7] | Lu, X. (Lu, X..) [8]

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Scopus

Abstract:

In this work, a novel gallium oxide (Ga $_{\text{2}}$ O $_{\text{3}}\text{)}$  vertical FinFET with integrated Schottky barrier diode (SBD-FinFET), which achieves low conduction losses, is proposed. In the reverse conduction state, the integrated SBD can provide additional low-resistance path to conduct reverse current, hence achieving low reverse conduction loss. In the switching state, the SBD-FinFET can also reduce gate–drain capacitance and gate charge, thus featuring fast switching speed and low switching losses. Furthermore, in the other states, the integrated SBD of the SBD-FinFET is in the OFF state, which does not significantly affect the device characteristics. The well-calibrated simulation results show that when compared with the state-of-the-art FinFET with integrated Fin channel and ohmic contact diode (FOD-FinFET), the SBD-FinFET can reduce reverse conduction loss, turn-on loss, and turn-off loss by 25%, 19%, and 22%, respectively, while other characteristics retain almost unchanged. IEEE

Keyword:

$\beta$ -gallium oxide (Ga $_{\text{2}}$ O $_{\text{3}}\text{)}_{, }$ conduction losses FinFET Schottky barrier diode (SBD)

Community:

  • [ 1 ] [Xu X.]College of Physics and Information Engineering, Fuzhou University, Fuzhou, China
  • [ 2 ] [Deng Y.]College of Physics and Information Engineering, Fuzhou University, Fuzhou, China
  • [ 3 ] [Li T.]College of Physics and Information Engineering, Fuzhou University, Fuzhou, China
  • [ 4 ] [Xu X.]Department of Electromechanical and Information Engineering, Putian University, Putian, China
  • [ 5 ] [Yang D.]College of Physics and Information Engineering, Fuzhou University, Fuzhou, China
  • [ 6 ] [Zhu M.]College of Physics and Information Engineering, Fuzhou University, Fuzhou, China
  • [ 7 ] [Zhang H.]College of Physics and Information Engineering, Fuzhou University, Fuzhou, China
  • [ 8 ] [Lu X.]College of Physics and Information Engineering, Fuzhou University, Fuzhou, China

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Source :

IEEE Transactions on Electron Devices

ISSN: 0018-9383

Year: 2024

Issue: 4

Volume: 71

Page: 1-6

2 . 9 0 0

JCR@2023

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 8

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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