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author:

Xu, Xiaorui (Xu, Xiaorui.) [1] (Scholars:许晓锐) | Deng, Yicong (Deng, Yicong.) [2] | Li, Titao (Li, Titao.) [3] (Scholars:李悌涛) | Xu, Xiaohui (Xu, Xiaohui.) [4] | Yang, Dan (Yang, Dan.) [5] (Scholars:杨丹) | Zhu, Minmin (Zhu, Minmin.) [6] (Scholars:朱敏敏) | Zhang, Haizhong (Zhang, Haizhong.) [7] (Scholars:张海忠) | Lu, Xiaoqiang (Lu, Xiaoqiang.) [8] (Scholars:卢孝强)

Indexed by:

EI Scopus SCIE

Abstract:

In this work, a novel gallium oxide (Ga2O3) vertical FinFET with integrated Schottky barrier diode (SBD-FinFET), which achieves low conduction losses, is proposed. In the reverse conduction state, the integrated SBD can provide additional low-resistance path to conduct reverse current, hence achieving low reverse conduction loss. In the switching state, the SBD-FinFET can also reduce gate-drain capacitance and gate charge, thus featuring fast switching speed and low switching losses. Furthermore, in the other states, the integrated SBD of the SBD-FinFET is in the OFF state, which does not significantly affect the device characteristics. The well-calibrated simulation results show that when compared with the state-of-the-art FinFET with integrated Fin channel and ohmic contact diode (FOD-FinFET), the SBD-FinFET can reduce reverse conduction loss, turn-on loss, and turn-off loss by 25%, 19%, and 22%, respectively, while other characteristics retain almost unchanged.

Keyword:

beta-gallium oxide (Ga2O3) conduction losses Electric breakdown Field effect transistors FinFET FinFETs Gallium Logic gates Schottky barrier diode (SBD) Schottky barriers Schottky diodes

Community:

  • [ 1 ] [Xu, Xiaorui]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 2 ] [Deng, Yicong]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 3 ] [Li, Titao]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 4 ] [Yang, Dan]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 5 ] [Zhu, Minmin]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 6 ] [Zhang, Haizhong]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 7 ] [Lu, Xiaoqiang]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 8 ] [Xu, Xiaorui]Fuzhou Univ, Sch Adv Mfg, Jinjiang 362200, Peoples R China
  • [ 9 ] [Deng, Yicong]Fuzhou Univ, Sch Adv Mfg, Jinjiang 362200, Peoples R China
  • [ 10 ] [Li, Titao]Fuzhou Univ, Sch Adv Mfg, Jinjiang 362200, Peoples R China
  • [ 11 ] [Yang, Dan]Fuzhou Univ, Sch Adv Mfg, Jinjiang 362200, Peoples R China
  • [ 12 ] [Zhu, Minmin]Fuzhou Univ, Sch Adv Mfg, Jinjiang 362200, Peoples R China
  • [ 13 ] [Zhang, Haizhong]Fuzhou Univ, Sch Adv Mfg, Jinjiang 362200, Peoples R China
  • [ 14 ] [Lu, Xiaoqiang]Fuzhou Univ, Sch Adv Mfg, Jinjiang 362200, Peoples R China
  • [ 15 ] [Xu, Xiaohui]Putian Univ, Dept Electromech & Informat Engn, Putian 351100, Peoples R China

Reprint 's Address:

  • 张海忠

    [Zhang, Haizhong]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China;;[Xu, Xiaohui]Putian Univ, Dept Electromech & Informat Engn, Putian 351100, Peoples R China

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Source :

IEEE TRANSACTIONS ON ELECTRON DEVICES

ISSN: 0018-9383

Year: 2024

Issue: 4

Volume: 71

Page: 2530-2535

2 . 9 0 0

JCR@2023

Cited Count:

WoS CC Cited Count: 6

SCOPUS Cited Count: 8

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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