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author:

Huang, Wei (Huang, Wei.) [1] | Yu, Jinling (Yu, Jinling.) [2] (Scholars:俞金玲) | Liu, Yu (Liu, Yu.) [3] | Peng, Yan (Peng, Yan.) [4] | Wang, Lijun (Wang, Lijun.) [5] | Liang, Ping (Liang, Ping.) [6] | Chen, Tangsheng (Chen, Tangsheng.) [7] | Xu, Xiangang (Xu, Xiangang.) [8] | Liu, Fengqi (Liu, Fengqi.) [9] | Chen, Yonghai (Chen, Yonghai.) [10]

Indexed by:

EI Scopus SCIE CSCD

Abstract:

Optical reflection anisotropy microscopy mappings of micropipe defects on the surface of a 4H-SiC single crystal are studied by the scanning anisotropy microscopy (SAM) system. The reflection anisotropy (RA) image with a 'butterfly pattern' is obtained around the micropipes by SAM. The RA image of the edge dislocations is theoretically simulated based on dislocation theory and the photoelastic principle. By comparing with the Raman spectrum, it is verified that the micropipes consist of edge dislocations. The different patterns of the RA images are due to the different orientations of the Burgers vectors. Besides, the strain distribution of the micropipes is also deduced. One can identify the dislocation type, the direction of the Burgers vector and the optical anisotropy from the RA image by using SAM. Therefore, SAM is an ideal tool to measure the optical anisotropy induced by the strain field around a defect.

Keyword:

33.20.Fb 68.35.Gy 78.20.Ci 78.20.H- edge dislocation reflection anisotropy scanning anisotropy microscopy SiC

Community:

  • [ 1 ] [Huang, Wei]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 2 ] [Liu, Yu]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 3 ] [Wang, Lijun]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 4 ] [Liang, Ping]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 5 ] [Liu, Fengqi]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 6 ] [Chen, Yonghai]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 7 ] [Huang, Wei]Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100049, Peoples R China
  • [ 8 ] [Chen, Yonghai]Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100049, Peoples R China
  • [ 9 ] [Huang, Wei]Nanjing Elect Devices Inst, Natl Key Lab Solid state Microwave Devices & Circu, Nanjing 210016, Peoples R China
  • [ 10 ] [Chen, Tangsheng]Nanjing Elect Devices Inst, Natl Key Lab Solid state Microwave Devices & Circu, Nanjing 210016, Peoples R China
  • [ 11 ] [Yu, Jinling]Fuzhou Univ, Inst Micro Nano Devices & Solar Cells, Sch Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 12 ] [Peng, Yan]Shandong Univ, State Key Lab Crystal Mat, Jinan250100 250100, Peoples R China
  • [ 13 ] [Xu, Xiangang]Shandong Univ, State Key Lab Crystal Mat, Jinan250100 250100, Peoples R China

Reprint 's Address:

  • 俞金玲

    [Chen, Yonghai]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China;;[Chen, Yonghai]Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100049, Peoples R China;;[Yu, Jinling]Fuzhou Univ, Inst Micro Nano Devices & Solar Cells, Sch Phys & Informat Engn, Fuzhou 350108, Peoples R China

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Source :

CHINESE PHYSICS B

ISSN: 1674-1056

CN: 11-5639/O4

Year: 2024

Issue: 3

Volume: 33

1 . 5 0 0

JCR@2023

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 1

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 4

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