Lunar-dust　protection　is　important　for　future　lunar　surface　exploration.　Lunar　dust　comprises　extremely　fine　particles　on　the　Moon’s　surface.　The　surface　shape　is　irregular,　and　the　average　diameter　is　40-130　μm.　It　is　primarily　composed　of　amorphous　glass,　plagioclase,　and　other　components,　and　contains　almost　all　trace　elements.　The　unique　physical　and　chemical　properties　of　lunar　dust　enable　it　to　be　easily　adsorbed　onto　the　surface　of　detectors　and　spacesuits,　thereby　resulting　in　equipment　failure.　Therefore,　the　micro-adsorption　behavior　of　lunar-dust　particles　on　the　surface　of　spacecraft　and　their　protection　technology　must　be　investigated.　This　paper　summarizes　and　discusses　the　micro-adsorption　mechanism　of　lunar-dust　particles,　the　measurement　technology　for　the　adsorption　force,　and　protection　methods　for　lunar　dust.　First,　combining　the　physical　and　chemical　properties　of　lunar-dust　particles,　the　causes　of　dusting　and　the　adsorption　behavior　on　the　Moon’s　surface　are　analyzed.　Furthermore,　an　analytical　model　of　the　adsorption　force　between　lunar-dust　particles　and　the　surface　of　the　probe　substrate　is　established,　including　van　der　Waals,　electrostatic,　and　capillary　forces.　However,　unlike　the　force　generated　by　water　molecules　in　the　ground　environment,　the　adsorption　force　between　lunar-dust　particles　and　the　sample　surface　in　an　ultrahigh　vacuum　environment　is　primarily　composed　of　van　der　Waals　and　electrostatic　forces,　and　the　capillary　force　need　not　be　considered　necessarily.　In　addition,　van　der　Waals　forces　dominates　short-range　actions,　whereas　electrostatic　forces　dominates　long-range　actions.　Based　on　this　model,　the　proportions　and　factors　affecting　each　component　of　the　adsorption　force　are　calculated.　Second,　adsorption-test　technology　is　categorized　into　contact　and　non-contact　technologies.　A　comparison　between　atomic-force　testing　technology　as　a　contact　technology　and　other　schemes　show　that　the　interference　factors　are　relatively　few　when　the　former　is　applied　to　measure　the　adsorption　force　of　lunar-dust　particles.　Its　measurement　accuracy　can　reach　the　nanometer　level,　and　the　single-point　microscopic　adsorption　characteristics　of　lunar-dust　particles　can　be　dynamically　observed,　thus　enabling　one　to　achieve　the　goals　of　high　precision　and　accuracy　more　easily.　Subsequently,　the　basic　principle　and　method　of　directly　reflecting　the　interaction　between　the　probe　and　sample　surface　using　the　deformation　value　of　the　probe　cantilever　beam　are　introduced.　Additionally,　active　and　passive　protection　technologies　of　van　der　Waals　forces,　electrostatic　forces,　and　mechanical　dust　control　for　the　adsorption　of　micro-nano　particles　are　systematically　summarized,　and　the　advantages　and　disadvantages　of　various　dust-removal　technologies　are　analyzed.　Passive　protection　technology　presents　fewer　influencing　factors　and　higher　stability,　thus　rendering　it　more　suitable　for　various　application　environments.　Finally,　the　development　trends　of　lunar-dust　adsorption　tests　and　lunar-dust　protection　technology　are　highlighted.　Notably,　high-vacuum　atomic-force-microscope　equipment,　which　feature　a　low　permeability,　should　be　popularized.　Currently,　macroscopic　adsorption　experiments　pertaining　to　the　dispersion　of　lunar　dust　are　few,　and　simulations　of　lunar　dust　should　be　further　optimized　and　developed.　In　this　study,　the　adsorption　mechanism　and　adsorption　model　of　lunar-dust　particles　under　micro-conditions　are　established,　and　the　applicability,　advantages,　and　disadvantages　of　atomic　testing　technology　are　discussed　based　on　the　adsorption　test　of　lunar-dust　particles.　The　test　process　steps　are　described　comprehensively.　This　scheme　overcomes　the　shortcomings　of　other　testing　technologies　and　is　crucial　for　promoting　research　pertaining　to　the　adsorption　mechanisms　and　protection　technologies　of　lunar-dust　particles.　Additionally,　it　serves　as　a　foundation　for　the　subsequent　screening　of　lunar-dust　friction　and　wear-test　materials.　©　2024　Chinese　Mechanical　Engineering　Society.　All　rights　reserved.