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author:

Liu, J. (Liu, J..) [1] | Wang, L. (Wang, L..) [2] | Wen, C. (Wen, C..) [3] | Yao, G. (Yao, G..) [4] | Xiao, Y. (Xiao, Y..) [5] | Su, Z. (Su, Z..) [6]

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Scopus

Abstract:

In perovskite resistive random access memories working with the formation of iodine vacancies conductive channels, I- ions in perovskite are migrated toward the anode and oxidized to I2 molecules, which then accumulated at the perovskite/anode interface under the applied positive voltage. However, I2 molecules are extremely unstable and easy to sublimate outside the devices. Here, a crown ether dibenzo-24-crown-8 (DB24C8) is adopted as the interface layer to eliminate the sublimation of I2 molecules and stabilize the storage of I2 inside the devices. Such an iodine management strategy is attributed to the charge transfer complex formed between DB24C8 and I2, and then form I3- and regenerate I- ions with the reaction of injected electrons under the applied negative voltage. Besides, DB24C8 can also passivate the defect states in the perovskite, which dramatically reduces the high resistance state current. As a result, the optimized device shows a high switching ratio (>104), a long retention time (>104 s), and large endurance cycles (>500). More importantly, it also exhibits excellent reproducibility and stability in ambient conditions. © 2024 Elsevier B.V.

Keyword:

Crown ether Defect passivation Interface layer Iodine management Perovskite memristor

Community:

  • [ 1 ] [Liu J.]College of Physics and Information Engineering, Fujian Key Laboratory for Advanced Micro-nano Photonics Technology and Devices, Quanzhou Normal University, Quanzhou, 362000, China
  • [ 2 ] [Liu J.]College of Photonic and Electronic Engineering, Fujian Normal University, Fuzhou, 350117, China
  • [ 3 ] [Wang L.]College of Chemical Engineering and Material, Quanzhou Normal University, Quanzhou, 362000, China
  • [ 4 ] [Wen C.]College of Physics and Information Engineering, Fujian Key Laboratory for Advanced Micro-nano Photonics Technology and Devices, Quanzhou Normal University, Quanzhou, 362000, China
  • [ 5 ] [Wen C.]School of Advanced Manufacturing, Fuzhou University, Quanzhou, 362251, China
  • [ 6 ] [Yao G.]College of Physics and Information Engineering, Fujian Key Laboratory for Advanced Micro-nano Photonics Technology and Devices, Quanzhou Normal University, Quanzhou, 362000, China
  • [ 7 ] [Xiao Y.]College of Chemical Engineering and Material, Quanzhou Normal University, Quanzhou, 362000, China
  • [ 8 ] [Su Z.]College of Physics and Information Engineering, Fujian Key Laboratory for Advanced Micro-nano Photonics Technology and Devices, Quanzhou Normal University, Quanzhou, 362000, China

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Source :

Journal of Alloys and Compounds

ISSN: 0925-8388

Year: 2025

Volume: 1010

5 . 8 0 0

JCR@2023

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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