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author:

Yang, Shichao (Yang, Shichao.) [1] | Liang, Xiaoxin (Liang, Xiaoxin.) [2] | Chen, Wenwei (Chen, Wenwei.) [3] | Wang, Qiuyan (Wang, Qiuyan.) [4] | Sa, Baisheng (Sa, Baisheng.) [5] | Guo, Zhiyong (Guo, Zhiyong.) [6] | Zheng, Jingying (Zheng, Jingying.) [7] | Pei, Jiajie (Pei, Jiajie.) [8] | Zhan, Hongbing (Zhan, Hongbing.) [9] | Wang, Qianting (Wang, Qianting.) [10]

Indexed by:

Scopus SCIE

Abstract:

2D materials exhibit unique properties for next-generation electronics and quantum devices. However, their sensitivity to temperature variations, particularly concerning cooling-induced strain, remains underexplored systematically. This study investigates the effects of cooling-induced strain on monolayer MoSe2 at cryogenic temperatures. It is emphasized that the mismatch in thermal expansion coefficients between the material and bulk substrate leads to significant external strain, which superimposes the internal strain of the material. By engineering the material-substrate 2D-bulk interface, the resulting strain conditions are characterized and reveal that substantial compressive strain induces new emission features linked to direct-to-indirect bandgap transition, as confirmed by photoluminescence and transient absorption spectroscopy studies. Finally, it is demonstrated that encapsulation with hexagonal boron nitride can mitigate the external strain by 2D-2D interfaces, achieving results similar to those of suspended samples. The findings address key challenges in quantifying and characterizing strain types across different 2D-bulk interfaces, distinguishing cooling-induced strain effects from other temperature-dependent phenomena, and designing strain-sensitive 2D material devices for extreme temperature conditions.

Keyword:

2D materials cooling interface engineering strain thermal expansion coefficients

Community:

  • [ 1 ] [Yang, Shichao]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Peoples R China
  • [ 2 ] [Liang, Xiaoxin]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Peoples R China
  • [ 3 ] [Chen, Wenwei]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Peoples R China
  • [ 4 ] [Sa, Baisheng]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Peoples R China
  • [ 5 ] [Guo, Zhiyong]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Peoples R China
  • [ 6 ] [Zheng, Jingying]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Peoples R China
  • [ 7 ] [Pei, Jiajie]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Peoples R China
  • [ 8 ] [Zhan, Hongbing]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Peoples R China
  • [ 9 ] [Wang, Qianting]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Peoples R China
  • [ 10 ] [Wang, Qiuyan]Minjiang Univ, Coll Phys & Elect Informat Engn, Fuzhou 350108, Peoples R China
  • [ 11 ] [Wang, Qianting]Xiamen Univ Technol, Sch Mat Sci & Engn, Xiamen 361024, Peoples R China

Reprint 's Address:

  • [Pei, Jiajie]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Peoples R China;;[Wang, Qianting]Fuzhou Univ, Coll Mat Sci & Engn, Fuzhou 350108, Peoples R China;;[Wang, Qianting]Xiamen Univ Technol, Sch Mat Sci & Engn, Xiamen 361024, Peoples R China

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Source :

ADVANCED MATERIALS

ISSN: 0935-9648

Year: 2025

Issue: 15

Volume: 37

2 7 . 4 0 0

JCR@2023

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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