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author:

Cao, Xianghong (Cao, Xianghong.) [1] | Ye, Yun (Ye, Yun.) [2] (Scholars:叶芸) | Tang, Qian (Tang, Qian.) [3] | Chen, Enguo (Chen, Enguo.) [4] (Scholars:陈恩果) | Jiang, Zongzhao (Jiang, Zongzhao.) [5] | Pan, Jianhao (Pan, Jianhao.) [6] | Guo, Tailiang (Guo, Tailiang.) [7] (Scholars:郭太良)

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Scopus SCIE

Abstract:

Multinozzle printing processing with the fabrication of a functional material film lays the foundation for the development of efficient scale production of a photoelectric device. However, a prominent challenge is how to realize the volume uniformity of the droplets. Here, a classical analysis method is introduced first by printing poly(3,4-ethylenedioxythiophene)/poly(styrenesulfonate) (PEDOT:PSS) to analyze the behavior of droplets. It relies on a variance calculation for the clarification of the law of implicit behavior of droplets in terms of digitizing. This method reveals the effect of printing parameters on the uniformity of the volume of droplets in multinozzle printing. Overall, by combining both ink formulations and printing parameter optimization, it is concluded that the minimum volume variance of nozzles with different numbers is less than 0.5% and the influence of various parameters in multinozzle printing is found to be ranked. The feasibility of this analysis method is presented and is of great significance to achieving a very stable, large-scale multinozzle printing device.

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Community:

  • [ 1 ] [Cao, Xianghong]Fuzhou Univ, Natl & Local United Engineer Lab Flat Panel Displ, Coll Phys & Informat Engn, Fuzhou 350116, Fujian, Peoples R China
  • [ 2 ] [Ye, Yun]Fuzhou Univ, Natl & Local United Engineer Lab Flat Panel Displ, Coll Phys & Informat Engn, Fuzhou 350116, Fujian, Peoples R China
  • [ 3 ] [Tang, Qian]Fuzhou Univ, Natl & Local United Engineer Lab Flat Panel Displ, Coll Phys & Informat Engn, Fuzhou 350116, Fujian, Peoples R China
  • [ 4 ] [Chen, Enguo]Fuzhou Univ, Natl & Local United Engineer Lab Flat Panel Displ, Coll Phys & Informat Engn, Fuzhou 350116, Fujian, Peoples R China
  • [ 5 ] [Jiang, Zongzhao]Fuzhou Univ, Natl & Local United Engineer Lab Flat Panel Displ, Coll Phys & Informat Engn, Fuzhou 350116, Fujian, Peoples R China
  • [ 6 ] [Pan, Jianhao]Fuzhou Univ, Natl & Local United Engineer Lab Flat Panel Displ, Coll Phys & Informat Engn, Fuzhou 350116, Fujian, Peoples R China
  • [ 7 ] [Guo, Tailiang]Fuzhou Univ, Natl & Local United Engineer Lab Flat Panel Displ, Coll Phys & Informat Engn, Fuzhou 350116, Fujian, Peoples R China
  • [ 8 ] [Ye, Yun]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350116, Fujian, Peoples R China
  • [ 9 ] [Tang, Qian]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350116, Fujian, Peoples R China
  • [ 10 ] [Chen, Enguo]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350116, Fujian, Peoples R China
  • [ 11 ] [Guo, Tailiang]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350116, Fujian, Peoples R China

Reprint 's Address:

  • 叶芸 郭太良

    [Ye, Yun]Fuzhou Univ, Natl & Local United Engineer Lab Flat Panel Displ, Coll Phys & Informat Engn, Fuzhou 350116, Fujian, Peoples R China;;[Guo, Tailiang]Fuzhou Univ, Natl & Local United Engineer Lab Flat Panel Displ, Coll Phys & Informat Engn, Fuzhou 350116, Fujian, Peoples R China;;[Ye, Yun]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350116, Fujian, Peoples R China;;[Guo, Tailiang]Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350116, Fujian, Peoples R China

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Source :

JOURNAL OF PHYSICAL CHEMISTRY LETTERS

ISSN: 1948-7185

Year: 2020

Issue: 19

Volume: 11

Page: 8442-8450

6 . 4 7 5

JCR@2020

4 . 9 0 0

JCR@2023

ESI Discipline: CHEMISTRY;

ESI HC Threshold:160

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 26

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 5

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