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author:

Fu, Qiuping (Fu, Qiuping.) [1] | Zhuang, Naifeng (Zhuang, Naifeng.) [2] (Scholars:庄乃锋) | Hu, Xiaolin (Hu, Xiaolin.) [3] (Scholars:胡晓琳) | Chen, Jianzhong (Chen, Jianzhong.) [4] (Scholars:陈建中)

Indexed by:

EI Scopus SCIE

Abstract:

Herein, SmFeO3 thin films are prepared by using magnetron sputtering technology on quartz-glass and SrTiO3(STO)(100) substrates. The influence of film thickness and choice of substrate on film quality and growth orientation is studied in detail. Moreover, the impact of phase purity and growth orientation on optical, magnetic and magneto-optical properties is discussed. The results reveal that the film thickness and choice of substrate significantly influence the induced stresses at film/substrate interface and growth orientation of the annealed film The as-fabricated SmFeO3 thin films have demonstrated highly crystalline structure, excellent transmittance and enhanced magneto-optical properties. Moreover, obvious anisotropy in magnetization and magneto-optical properties has been observed. The SmFeO3 films with excellent magneto-optical properties can be fabricated by selecting optimal film thickness and substrate. It is expected that SmFeO3 film is a promising material for integrated optical isolators and magneto-optical modulators.

Keyword:

magnetic magnetic circular dichroism (MCD) optical SmFeO3 thin film SrTiO3 (STO) substrate

Community:

  • [ 1 ] [Fu, Qiuping]Guiyang Univ, Coll Chem & Mat Engn, Guiyang 550005, Peoples R China
  • [ 2 ] [Zhuang, Naifeng]Fuzhou Univ, Coll Chem, Fuzhou 350116, Peoples R China
  • [ 3 ] [Hu, Xiaolin]Fuzhou Univ, Coll Chem, Fuzhou 350116, Peoples R China
  • [ 4 ] [Chen, Jianzhong]Fuzhou Univ, Coll Chem, Fuzhou 350116, Peoples R China

Reprint 's Address:

  • 庄乃锋

    [Fu, Qiuping]Guiyang Univ, Coll Chem & Mat Engn, Guiyang 550005, Peoples R China;;[Zhuang, Naifeng]Fuzhou Univ, Coll Chem, Fuzhou 350116, Peoples R China

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Source :

JOURNAL OF PHYSICS-CONDENSED MATTER

ISSN: 0953-8984

Year: 2020

Issue: 10

Volume: 32

2 . 3 0 0

JCR@2023

ESI Discipline: PHYSICS;

ESI HC Threshold:115

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count: 5

SCOPUS Cited Count: 5

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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