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author:

Oyama, S. Ted (Oyama, S. Ted.) [1] | Aono, Haruki (Aono, Haruki.) [2] | Takagaki, Atsushi (Takagaki, Atsushi.) [3] | Kikuchi, Ryuji (Kikuchi, Ryuji.) [4] | Sugawara, Takashi (Sugawara, Takashi.) [5]

Indexed by:

EI Scopus SCIE

Abstract:

Silica-based membranes prepared by chemical vapor deposition of tetraethylorthosilicate (TEOS) on gamma-alumina overlayers are known to be effective for hydrogen separation and are attractive for membrane reactor applications for hydrogen-producing reactions. In this study, the synthesis of the membranes was improved by simplifying the deposition of the intermediate gamma-alumina layers and by using the precursor, dimethyldimethoxysilane (DMDMOS). In the placement of the gamma-alumina layers, earlier work in our laboratory employed four to five dipping-calcining cycles of boehmite sol precursors to produce high H-2 selectivities, but this took considerable time. In the present study, only two cycles were needed, even for a macro-porous support, through the use of finer boehmite precursor particle sizes. Using the simplified fabrication process, silica-alumina composite membranes with H-2 permeance > 10(-7) mol m(-2) s(-1) Pa-1 and H-2/N-2 selectivity >100 were successfully synthesized. In addition, the use of the silica precursor, DMDMOS, further improved the H-2 permeance without compromising the H-2/N-2 selectivity. Pure DMDMOS membranes proved to be unstable against hydrothermal conditions, but the addition of aluminum tri-sec-butoxide (ATSB) improved the stability just like for conventional TEOS membranes.

Keyword:

chemical vapor deposition dimethyldimethoxysilane (DMDMOS) gamma-alumina intermediate layers hydrogen helium separation hydrothermal stability silica-alumina membrane

Community:

  • [ 1 ] [Oyama, S. Ted]Fuzhou Univ, Coll Chem Engn, Fuzhou 350116, Peoples R China
  • [ 2 ] [Oyama, S. Ted]Univ Tokyo, Dept Chem Syst Engn, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan
  • [ 3 ] [Aono, Haruki]Univ Tokyo, Dept Chem Syst Engn, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan
  • [ 4 ] [Takagaki, Atsushi]Univ Tokyo, Dept Chem Syst Engn, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan
  • [ 5 ] [Kikuchi, Ryuji]Univ Tokyo, Dept Chem Syst Engn, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan
  • [ 6 ] [Sugawara, Takashi]Univ Tokyo, Dept Chem Syst Engn, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan
  • [ 7 ] [Oyama, S. Ted]Virginia Tech, Dept Chem Engn, Blacksburg, VA 24061 USA
  • [ 8 ] [Takagaki, Atsushi]Kyushu Univ, Fac Engn, Dept Appl Chem, Nishi Ku, 744 Motooka, Fukuoka 8190395, Japan

Reprint 's Address:

  • 大山茂生

    [Oyama, S. Ted]Fuzhou Univ, Coll Chem Engn, Fuzhou 350116, Peoples R China;;[Oyama, S. Ted]Univ Tokyo, Dept Chem Syst Engn, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan;;[Oyama, S. Ted]Virginia Tech, Dept Chem Engn, Blacksburg, VA 24061 USA

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Source :

MEMBRANES

ISSN: 2077-0375

Year: 2020

Issue: 3

Volume: 10

4 . 1 0 6

JCR@2020

3 . 3 0 0

JCR@2023

ESI Discipline: CHEMISTRY;

ESI HC Threshold:160

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 10

SCOPUS Cited Count: 11

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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