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author:

Sun, Lei (Sun, Lei.) [1] (Scholars:孙磊) | Zhou, Xiongtu (Zhou, Xiongtu.) [2] (Scholars:周雄图) | Lin, Zhixian (Lin, Zhixian.) [3] (Scholars:林志贤) | Guo, Tailiang (Guo, Tailiang.) [4] (Scholars:郭太良) | Zhang, Yongai (Zhang, Yongai.) [5] (Scholars:张永爱) | Zeng, Yongzhi (Zeng, Yongzhi.) [6] (Scholars:曾永志)

Indexed by:

EI Scopus SCIE

Abstract:

ZnO quantum dots (QDs) have been decorated on graphene deposited on patterned Ag electrodes as a field emission cathode by a solution process. Effects of ZnO QDs on the field emission behavior of graphene are studied by experiment and first-principles calculations. The results indicate that the attachment of ZnO QDs with a C atom leads to the enhancement of electron emission from graphene, which is mainly attributed to the reduction of the work function and ionization potential, and the increase of the Fermi level of graphene after the decoration. A change in the local density distribution and the density of states near the Fermi level may also account for this behavior. Our study may help to develop new field emission composites and expand ZnO QDs in applications for electron emission devices as well.

Keyword:

field emission first-principle density functional calculations graphene hybrid ZnO quantum dots

Community:

  • [ 1 ] [Sun, Lei]Fuzhou Univ, Natl & Local United Engineer Lab Flat Panel Displ, Fuzhou 350002, Peoples R China
  • [ 2 ] [Zhou, Xiongtu]Fuzhou Univ, Natl & Local United Engineer Lab Flat Panel Displ, Fuzhou 350002, Peoples R China
  • [ 3 ] [Lin, Zhixian]Fuzhou Univ, Natl & Local United Engineer Lab Flat Panel Displ, Fuzhou 350002, Peoples R China
  • [ 4 ] [Guo, Tailiang]Fuzhou Univ, Natl & Local United Engineer Lab Flat Panel Displ, Fuzhou 350002, Peoples R China
  • [ 5 ] [Zhang, Yongai]Fuzhou Univ, Natl & Local United Engineer Lab Flat Panel Displ, Fuzhou 350002, Peoples R China
  • [ 6 ] [Zeng, Yongzhi]Fuzhou Univ, Natl & Local United Engineer Lab Flat Panel Displ, Fuzhou 350002, Peoples R China
  • [ 7 ] [Sun, Lei]Fuzhou Univ, Zhicheng Coll, Fuzhou 350002, Peoples R China

Reprint 's Address:

  • 张永爱 曾永志

    [Zhang, Yongai]Fuzhou Univ, Natl & Local United Engineer Lab Flat Panel Displ, Fuzhou 350002, Peoples R China;;[Zeng, Yongzhi]Fuzhou Univ, Natl & Local United Engineer Lab Flat Panel Displ, Fuzhou 350002, Peoples R China

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Source :

ACS Applied Materials & Interfaces

ISSN: 1944-8244

Year: 2016

Issue: 46

Volume: 8

Page: 31856-31862

7 . 5 0 4

JCR@2016

8 . 5 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:324

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 15

SCOPUS Cited Count: 15

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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