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author:

Ma, Zehao (Ma, Zehao.) [1] | Wu, Chaoxing (Wu, Chaoxing.) [2] (Scholars:吴朝兴) | Lee, Dea Uk (Lee, Dea Uk.) [3] | Li, Fushan (Li, Fushan.) [4] (Scholars:李福山) | Kim, Tae Whan (Kim, Tae Whan.) [5]

Indexed by:

EI Scopus SCIE

Abstract:

Multilevel resistive memory devices with an intermediate state were fabricated utilizing a poly(methylmethacrylate) (PMMA) layer sandwiched between double-stacked PMMA layers containing CdSe/ZnS core shell quantum dots (QDs). The current voltage (I-V) curves on a Al/[PMMA:CdSe/ZnS QD]/PMMA/[PMMA:CdSe/ZnS QD]/indium-tin-oxide/glass device at low applied voltages showed current bistabilities with three states, indicative of multilevel characteristics. A reliable intermediate state was realized under positive and negative applied voltages. The carrier transport and the memory mechanisms of the devices were described on the basis of the I-V curves and energy band diagrams, respectively. The write-read-erase-read-erase-read sequence of the devices showed rewritable, nonvolatile, multilevel, and memory behaviors. The currents as functions of the retention time showed that three current states were maintained for retention times larger than 1 x 10(4) s, indicative of the good stability of the devices. (C) 2015 Elsevier B.V. All rights reserved.

Keyword:

CdSe/ZnS QD Memory mechanisms Multilevel characteristics PMMA Resistive memory device

Community:

  • [ 1 ] [Ma, Zehao]Hanyang Univ, Dept Elect & Comp Engn, Seoul 133791, South Korea
  • [ 2 ] [Lee, Dea Uk]Hanyang Univ, Dept Elect & Comp Engn, Seoul 133791, South Korea
  • [ 3 ] [Kim, Tae Whan]Hanyang Univ, Dept Elect & Comp Engn, Seoul 133791, South Korea
  • [ 4 ] [Wu, Chaoxing]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 5 ] [Li, Fushan]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China

Reprint 's Address:

  • [Kim, Tae Whan]Hanyang Univ, Dept Elect & Comp Engn, Seoul 133791, South Korea

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Source :

ORGANIC ELECTRONICS

ISSN: 1566-1199

Year: 2016

Volume: 28

Page: 20-24

3 . 3 9 9

JCR@2016

2 . 7 0 0

JCR@2023

ESI Discipline: PHYSICS;

ESI HC Threshold:186

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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