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author:

Ooi, Poh Choon (Ooi, Poh Choon.) [1] | Li, Fushan (Li, Fushan.) [2] (Scholars:李福山) | Veeramalai, Chandrasekar Perumal (Veeramalai, Chandrasekar Perumal.) [3] | Guo, Tailiang (Guo, Tailiang.) [4] (Scholars:郭太良)

Indexed by:

EI Scopus SCIE

Abstract:

In this work, a transparent and flexible nonvolatile memory was fabricated using a solution process. The conduction mechanisms of the metal/insulator/metal structure consisting of cadmium selenide quantum dots embedded in poly(methylsilsesquioxane) dielectric layers were investigated in terms of current-voltage characteristics. The memory device is reprogrammable and stable up to 1 x 10(4) s with little deterioration and a distinct ON/OFF ratio of 10(4). Endurance cycle and retention tests of the as-fabricated memory device were also carried out. The results indicate that the device has good operating stability. (C) 2014 The Japan Society of Applied Physics

Keyword:

Community:

  • [ 1 ] [Ooi, Poh Choon]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 2 ] [Li, Fushan]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 3 ] [Veeramalai, Chandrasekar Perumal]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 4 ] [Guo, Tailiang]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China

Reprint 's Address:

  • Poh Choon Ooi

    [Ooi, Poh Choon]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China

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Source :

JAPANESE JOURNAL OF APPLIED PHYSICS

ISSN: 0021-4922

Year: 2014

Issue: 12

Volume: 53

1 . 1 2 7

JCR@2014

1 . 5 0 0

JCR@2023

ESI Discipline: PHYSICS;

ESI HC Threshold:213

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count: 10

SCOPUS Cited Count: 11

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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