We　report　a　direct　electrochemical　deposition　process　to　produce　ZnO　nanorods　or　a　ZnO　thin　film　on　an　indium　tin　oxide　(ITO)　substrate.　The　ZnO　film　was　etched　by　an　agarose　stamp　containing　HCl　as　the　etchant　to　form　different　patterns.　The　structure,　morphology,　and　electrochemical　properties　of　the　ZnO　thin　films　on　the　ITO　substrate　were　characterized　by　scanning　electron　microscopy　(SEM),　X-ray　diffraction　(XRD),　and　scanning　electrochemical　microscopy　(SECM).