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author:

Li, Weihao (Li, Weihao.) [1] | Zhu, Longguang (Zhu, Longguang.) [2] | Ji, Feng (Ji, Feng.) [3] | Yu, Jinling (Yu, Jinling.) [4] (Scholars:俞金玲) | Jin, Yufeng (Jin, Yufeng.) [5] | Wang, Wei (Wang, Wei.) [6]

Indexed by:

CPCI-S EI Scopus

Abstract:

With semiconductor processes advancing, integrated circuits have moved further along the Moore's Law [1]. Meanwhile, chip integration and power density increased substantially, making thermal problems more serious [2]. In this circumstance, researchers have conducted a large number of experiments on fluid flow and heat transfer in microchannels, to improve cooling performance. In the early days, microchannel heat dissipation technique was mostly achieved by etching microchannels on silicon wafers. There is no doubt that diamond has a thermal conductivity one magnitude higher than silicon. So diamond can improve the heat dissipation performance of the heat sink. Due to diamond etching technology has been developed, the use of diamond as a material for heat sinks has received extensive attention. In this paper, finite element simulation is used to study thermal property of diamond heat sink. The microchannel heat sink is fabricated by bonding a diamond wafer and a silicon wafer. Temperature rise is the objective function to be minimized with height of microchannels (H-c), number of microchannels (N), and the duty ratio of microchannel (alpha), as optimize variables. Depending on the experimental results, combined with the actual feasibility, the best result is that the flow path height is 250 mu m, the duty ratio is 0.7, and the number of flow channels is 60. Under this condition, the temperature rise is 30 degrees C.

Keyword:

Diamond Heat Sink Microchannel Parameters Optimization

Community:

  • [ 1 ] [Li, Weihao]Fuzhou Univ, Sch Phys & Informat Engn, Inst Micro Nano Devices & Solar Cells, Fuzhou, Peoples R China
  • [ 2 ] [Yu, Jinling]Fuzhou Univ, Sch Phys & Informat Engn, Inst Micro Nano Devices & Solar Cells, Fuzhou, Peoples R China
  • [ 3 ] [Zhu, Longguang]Peking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Shenzhen, Peoples R China
  • [ 4 ] [Jin, Yufeng]Peking Univ, Shenzhen Grad Sch, Sch Elect & Comp Engn, Shenzhen, Peoples R China
  • [ 5 ] [Ji, Feng]Beijing Inst Remote Sensing Equipment, Beijing, Peoples R China
  • [ 6 ] [Wang, Wei]Peking Univ, Inst Microelect, Beijing, Peoples R China

Reprint 's Address:

  • [Wang, Wei]Peking Univ, Inst Microelect, Beijing, Peoples R China

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Source :

ICEPT2019: THE 2019 20TH INTERNATIONAL CONFERENCE ON ELECTRONIC PACKAGING TECHNOLOGY

Year: 2019

Language: English

Cited Count:

WoS CC Cited Count: 4

SCOPUS Cited Count: 5

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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