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author:

Chen, Leifeng (Chen, Leifeng.) [1] | He, Hong (He, Hong.) [2] | Lei, Da (Lei, Da.) [3] | Menggen, Qiqige (Menggen, Qiqige.) [4] | Hu, Liqin (Hu, Liqin.) [5] | Yang, Deren (Yang, Deren.) [6]

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Abstract:

Graphene (GP) field emitters fabricated by the electrophoretic deposition (EPD) and their field emission performance can be enhanced and tailed simultaneously by chemical doping Au nanoparticles (NPs). It was found that doped Au NPs could both decrease the resistance of GP emitters and increase the density of field emission sites. The Au-doped GP emitters showed lower turn-on voltage, lower threshold field, higher field enhancement factor, higher luminance intensity, and emitting uniformity, compared with that of pristine GP. This study will provide us to further understand the role of doping effect on the GP emitters used for the future display. © 2013 AIP Publishing LLC.

Keyword:

Electrophoresis Field emission Gold nanoparticles Graphene Nanoparticles

Community:

  • [ 1 ] [Chen, Leifeng]College of Materials and Environmental Engineering, Hangzhou Dianzi University, Hangzhou 310018, China
  • [ 2 ] [Chen, Leifeng]State Key Lab of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China
  • [ 3 ] [He, Hong]College of Materials and Environmental Engineering, Hangzhou Dianzi University, Hangzhou 310018, China
  • [ 4 ] [He, Hong]Key Laboratory of Eco-Textiles, Ministry of Education, Jiangnan University, Wuxi 214122, Jiangsu, China
  • [ 5 ] [Lei, Da]Ordos College of Inner Mongolia University, Inner Mongolia University, Ordos 017000, China
  • [ 6 ] [Menggen, Qiqige]Ordos College of Inner Mongolia University, Inner Mongolia University, Ordos 017000, China
  • [ 7 ] [Hu, Liqin]College of Physics and Information Engineering, Fuzhou University, Fuzhou 350002, China
  • [ 8 ] [Yang, Deren]State Key Lab of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China

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Source :

Applied Physics Letters

ISSN: 0003-6951

Year: 2013

Issue: 23

Volume: 103

3 . 5 1 5

JCR@2013

3 . 5 0 0

JCR@2023

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 28

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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