Abstract:
氮化硅薄膜具有致密的结构、高强度和良好的耐磨性能,可用于MEMS器件中作为结构部件.本文采用PECVD法制备氮化硅薄膜,对氮化硅薄膜的杨氏模量和硬度进行了测试,并分析了沉积温度、反应气体流量比对薄膜杨氏模量和硬度的影响.应用氮化硅薄膜作为悬梁,制作了射频MEMS开关.
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Year: 2006
Page: 1967-1969
Language: Chinese
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SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count: -1
Chinese Cited Count:
30 Days PV: 6
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